Nitride on Silicon

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We can deposit Nitride onto the following diameters

 

25.4mm

50.8mm

76.2mm

100mm

150mm

200mm

300mm

 

Buy Nitride on Silicon

     

    Silicon Nitride

    has good high temperature strength, creep resistance and oxidation resistance.
    Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance.


    Silicon Nitride is produced in three main types; Reaction Bonded Silicon Nitride (RBSN), Hot Pressed Silicon Nitride (HPSN) and Sintered Silicon Nitride (SSN). We have Silicon Nitride 2" - 12" all specs and quanities.

Silicon Nitride Wafers LPCVD and PECVD in stock!

 

We have a large selection of

 

Stochiometric Nitride

 

Low Stress Nitride

 

Super Low Stress Nitride

 

Wafers in stock in small and large quantities.

 

 

Buy as few as one Niride Wafer!

 

Stoichiometric LPCVD Nitride

 

Our Standard nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.

 

Low Stress Nitride

Our Low Stress Nitride retains all of the same benefits associated with our standard nitride but can also be used for Membranes, Cantilever Beams and other mechanical structures associated with MEMS devices.

 

Super Low Stress Nitride

Our Super low stress nitride has been developed for applications that require extremely low film stress. Film Stress can also be customized to meet your unique specifications.

 

 

New PECVD Nitride Services

 

PECVD Nitride

is a single sided film that has been optimized for wafers requiring minimal thermal processing. 
Because PECVD Nitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films. 

 

PECVD OxyNitride

A single sided film that has been optimized for

wafers requiring minimal thermal processing. 
Because PECVD OxyNitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films. 

 

Low Stress PECVD Nitride

A single sided film that has been optimized for wafers requiring minimal thermal processing.  Because Low Stress PECVD Nitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films. 

 

PECVD Oxide

A single sided film that has been optimized for wafers requiring minimal thermal processing.  Because PECVD is a deposited oxide, it offers greater flexibility than thermal oxide and can be deposited over any of our other thin films. 

 

PECVD Silicon Carbide

for wafers requiring minimal thermal processing. 
Because PECVD Silicon Carbide is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films