UniversityWafer, Inc. and our partners provide custom sputtering and e-gun evaporation services:
We help researchers in all there research, development and production needs in both academia and industry. Below are just some industries that we cater to.
A research client asked us the following:
I am looking for wafers coated with a carbon thin film. I am interested in both amorphous or glassy carbon about 1-2 microns thick. Do you know if anything like that exists?
I was thinking of a 4" Si wafer. Ideally the carbon layer would be be on SOI with the oxide and Si ~2microns thick. The carbon on 2-3 microns SiO2 would be good too. The carbon should be low stress.
I am guessing I would need to purchase the SOI wafer and then grow my own carbon, but I wanted to see if by chance something similar like that already exists.
Our historically maximum sputtered C thickness is 3,080Å.
If we push our sputtering process, we anticipate a maximum thickness of 8,000Å.
We do not know if it is amorphous or glassy.
We do know that n = 1.25 and k = 0.50 @ 632.8nm. This means that our sputtered C is a mixture of diamond and graphite.
Thank you for your response, this is interesting information. What is the reason for the upper limit? The nature of carbon films seems very variant, DLC, glassy, amorphous....mixture of Sp3/sp2.... I am interested in an electrically conducting film, best not shiny, so a mixture of diamond and graphite is ok, not too much diamond, which is typically not a problem! How much would 4" SOI wafer cost with the carbon sputtered on them? I cn chose the SOI wafer from your list, but could you let me know what the additional cost of the carbon would be and wha the minimum wafer count is? Also, do you know what the surface stresses are?
Thank you for your response, this is interesting information. What is the reason for the upper limit? In this case the upper limit is set by a full day (8 hours) of deposition time. We are unable to run any deposition longer than 8 hours.
The nature of carbon films seems very variant, DLC, glassy, amorphous....mixture of Sp3/sp2.... Yes, we do not have a characterized C film, except for the n and k values reported earlier.
I am interested in an electrically conducting film, best not shiny, so a mixture of diamond and graphite is ok, not too much diamond, which is typically not a problem! The film is weakly conducting. The sheet resistance is high, outside of the range of our 4-point probe.
How much would 4" SOI wafer cost with the carbon sputtered on them? I cn chose the SOI wafer from your list, but could you let me know what the additional cost of the carbon would be and wha the minimum wafer count is? Our lot charge for in-situ sputter etch followed by sputter deposition of 8,000Å C is $3,300. Lot size = up to 12 wafers, 100mm dia. This job is considered as Experimental Work, to be done on a best efforts basis. Please refer to paragraph 8 in the attached Terms and Conditions of Sale.
Also, do you know what the surface stresses are? We have no data on film stress at this time. But we hope to have some data within the next few days.
New data as of today: Stress of sputtered C film (100nm thick): 913 MPa (compressive).
UniversityWafer, Inc. and partners, are experts in assiting researchers with their vacuum deposition needs. We can provide all diameters with a large selection of coatings below. Small quantities are no problem.
UniversityWafer, Inc. and our partners can help your research with our advanced vacuum thin film deposition services on our substrates or on you-the researcher. We can sputter or evaporate on almost any substrate of any diameter. Small quantity orders are no problem.
Our clean rooms house 5 sputtering systems with load locks and an e-gun evaporation system with a 4-pocket hearth.
We Sputter Coat on our Perkin/Elmer 4410 and MRC 903 sputtering machines.
Our Electron beam evaporations are handled in our modified CHA vacuum systems-which are cryopumped and housed in a Class 1000 clean room.
We also specialize on surface acoustic wave (SAW) device fabrication on piezoelectric materials including quartz or Lithium Niobite (LiNbO3).
Please let us know what we can quote for you today.
|Conductive metals||Al, Au, Ag, Cu|
|Aluminum alloys||Al-1%Si, Al-.5%Si, Al-1%Cu|
|Adhesion metals||Cr, Ti, Ti-90%W|
|Refractory metals||Mo, Nb, Ta, W, Hf|
|Platinum group metals||Pt|
|Magnetic metals||Ni, Fe, Co, Co-20%Cr|
|Non-magnetic alloys||Ni-20%Cr, Ni-7%V|
|Other alloys||Ti-50%Ni, CoCrAlY|
|Nitrides (reactively sputtered)||SiN, TiN, TaN, TaSi2N, Ta5Si3N, BN|
|Oxides||SiO2, Al2O3, TiO2, CrSiO, AZO, GlTO, YSZ, Borosilicate|
|Carbon, Carbide||C, SiC|
|What We Can Do||Evaporated Films|
|Conductive metals||Al, Au, Ag, Cu|
|Adhesion metals||Cr, Ti|
|Refractory metals||Mo, W|
|Platinum group metals||Pt, Pd, Ir, Ru|
|Magnetic metals||Ni, Fe, Co|
|Soft metals||In, Sn|
|Oxides||SiO2, Al2O3, TiO2, HfO2|
|Ta2O5, Y2O3, In2O3, SnO2|
|Ga2O3, SiO, MgO, CeO2|
|Fluorides||CaF2, MgF2, BaF2, LaF3, YF3|
Silicon wafers used in a study on soluble amyloid B-Oligomers and their affect on dielectric membrane properties.
We have gold-coated silicon wafers that researchers have used as electrodes for EIS measurements in six distinct electrochemical cells.
Clients have used the following cobalt coated substrates to cross compare their ellipsometry data.
100mm P(100) 1-10 ohm-cm SSP 500um Prime Grade with Cobalt (Co) thin film thicknesses.