Nitride on Silicon Wafers Stoichiometric, Low & Super Low Stress

University Wafer Silicon Wafers and Semicondcutor Substrates Services
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Silicon Nitride Wafers LPCVD - Buy Online

 

Ask for the Nitride wafers that we have in stock.

 

Stoichiometric LPCVD Nitride - Our Standard nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.

Our Low Stress Nitride retains all of the same benefits associated with our standard nitride but can also be used for Membranes, Cantilever Beams and other mechanical structures associated with MEMS devices.

Our Super low stress nitride has been developed for applications that require extremely low film stress. Film Stress can also be customized to meet your unique specifications.

Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance. Silicon Nitride is produced in three main types; Reaction Bonded Silicon Nitride (RBSN), Hot Pressed Silicon Nitride (HPSN) and Sintered Silicon Nitride (SSN). We have Silicon Nitride 2" - 12" all specs and quanities.

Fill out the form for an immediate quote.

 

Silicon Nitride Wafers LPCVD

 

Ask for the Nitride wafers that we have in stock.

 

Stoichiometric LPCVD Nitride - Our Standard nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.

Our Low Stress Nitride retains all of the same benefits associated with our standard nitride but can also be used for Membranes, Cantilever Beams and other mechanical structures associated with MEMS devices.

Our Super low stress nitride has been developed for applications that require extremely low film stress. Film Stress can also be customized to meet your unique specifications.

Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance. Silicon Nitride is produced in three main types; Reaction Bonded Silicon Nitride (RBSN), Hot Pressed Silicon Nitride (HPSN) and Sintered Silicon Nitride (SSN). We have Silicon Nitride 2" - 12" all specs and quanities.

Fill out the form for an immediate quote.

 

Silicon Nitride Wafers PECVD


Our PECVD Nitride is a single sided film that has been optimized for wafers requiring minimal thermal processing. Because PECVD Nitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films.

Wafers Sizes up to 300mm

Capable of handling custom substrate shapes, sizes and materials

Thickness up to 2µm

Tolerance: +/- 7% or better

Film Stress: 600MPa Tensile

Refractive Index: 2.00

Temperature: 350C

Our PECVD OxyNitride is a single sided film that has been optimized for wafers requiring minimal thermal processing. Because PECVD OxyNitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films.

 

Nitride Silicon Wafers Sizes up to 300mm

Capable of handling custom substrate shapes, sizes and materials

Thickness up to 2µm

Tolerance: +/- 7% or better

Film Stress: Variable

Refractive Index: 1.5-1.9 (Per customer request)

Temperature: 350C

Our Low Stress PECVD Nitride is a single sided film that has been optimized for wafers requiring minimal thermal processing. Because Low Stress PECVD Nitride is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films.

 

Wafers Sizes up to 300mm
Capable of handling custom substrate shapes, sizes and materials
Thickness up to 2µm

Tolerance: +/- 7% or better

Film Stress: <250MPa

Refractive Index: 2.00

Temperature: 350C

Our PECVD Oxide is a single sided film that has been optimized for wafers requiring minimal thermal processing. Because PECVD is a deposited oxide, it offers greater flexibility than thermal oxide and can be deposited over any of our other thin films.

 

Wafers Sizes up to 300mm

Capable of handling custom substrate shapes, sizes and materials

Thickness up to 2µm

Tolerance: +/- 7% or better

Film Stress: 400MPa Compressive

Refractive Index: 1.46

Temperature: 350C

PECVD Silicon Carbide for wafers requiring minimal thermal processing. Because PECVD Silicon Carbide is deposited at low temperatures, it offers greater flexibility and can be deposited over any of our other thin films

 

Wafers Sizes up to 300mm

Capable of handling custom substrate shapes, sizes and materials

Thickness up to 2um

Tolerance: +/- 7% or better

Film Stress: <100MPa

Refractive Index: 2.73

Temperature: 350C

 

Silicon Nitride LPCVD

Buy Your Nitride Silicon Wafers Online and Save!

Stochiometric, low stress and super low stress nitride can be purchased online in quantities from just one wafer to thousands.

We have all diameters, from 25.4mm to 300mm avaialble. Below are just some of what we have in stock.

50.8mm (2 Inch) LPCVD Nitride on Silicon Wafers

 

ID Diam Type Dop Orien Res (Ohm-cm) Thick (um) Polish Description
3307 50.8mm P B <100> 0.001-0.005 270um SSP w/ 100nm Stoichiometric LPCVD Nitride
3445 50.8mm P B <100> 0-100 500um DSP w/ 620nm LPCVD Nitride
3538 50.8mm P B <100> 1--10 280um SSP with 100nm Standard LPCVD Nitride
3539 50.8mm P B <100> 1--10 280um SSP with 300nm of Standard LPCVD Nitride
3540 50.8mm P B <100> 1--10 280um SSP with 100nm Low Stress LPCVD Nitride
3541 50.8mm P B <100> 1--10 280um SSP with 300nm Low Stress LPCVD Nitride
3542 50.8mm P B <100> 1--10 280um SSP with 2,000nm Low Stress LPCVD Nitride
3543 50.8mm P B <100> 1--10 280um SSP with 100nm Super Low Stress LPCVD Nitride
3544 50.8mm P B <100> 1--10 280um SSP with 300nm Super Low Stress LPCVD Nitride
3545 50.8mm P B <100> 1--10 280um SSP with 2,000nm Super Low Stress LPCVD Nitride
3546 50.8mm N P <100> 1--10 280um SSP with 100nm Standard LPCVD Nitride
3547 50.8mm N P <100> 1--10 280um SSP with 300nm Standard LPCVD Nitride
3548 50.8mm N P <100> 1--10 280um SSP with 100nm Low Stress LPCVD Nitride
3549 50.8mm N P <100> 1--10 280um SSP with 300nm Low Stress LPCVD Nitride
3550 50.8mm N P <100> 1--10 280um SSP with 2,000nm Low Stress LPCVD Nitride
3551 50.8mm N P <100> 1--10 280um SSP with 100nm Super Low Stress LPCVD Nitride
3552 50.8mm N P <100> 1--10 280um SSP with 300nm Super Low Stress LPCVD Nitride
3553 50.8mm N P <100> 1--10 280um SSP with 2,000nm Super Low Stress LPCVD Nitride

 

76.2mm (3 inch) Nitride on Silicon

 

ID Diam Type Dopant Orien Res (Ohm-cm) Thick (um) Polish Grade Description
3446 76.2mm     <111>   250um DSP Test w/ 200nm Low Stress Nitride
3480 76.2mm ANY ANY <100>   250um DSP Test w/ 200nm Low Stress Nitride
3554 76.2mm P B <100> 1--10 380um SSP Prime with 100nm Standard LPCVD Nitride
3555 76.2mm P B <100> 1--10 380um SSP Prime with 300nm Standard LPCVD Nitride
3556 76.2mm P B <100> 1--10 380um SSP Prime with 100nm Low Stress LPCVD Nitride
3557 76.2mm P B <100> 1--10 380um SSP Prime with 300nm Low Stress LPCVD Nitride
3558 76.2mm P B <100> 1--10 380um SSP Prime with 2,000nm Low Stress LPCVD Nitride
3559 76.2mm P B <100> 1--10 380um SSP Prime with 100nm Super Low Stress LPCVD Nitride
3560 76.2mm P B <100> 1--10 380um SSP Prime with 300nm Super Low Stress LPCVD Nitride
3561 76.2mm P B <100> 1--10 380um SSP Prime with 2,000nm Super Low Stress LPCVD Nitride
3562 76.2mm N P <100> 1--10 380um SSP Prime with 100nm Standard LPCVD Nitride
3563 76.2mm N P <100> 1--10 380um SSP Prime with 300nm Standard LPCVD Nitride
3564 76.2mm N P <100> 1--10 380um SSP Prime with 100nm Low Stress LPCVD Nitride
3565 76.2mm N P <100> 1--10 380um SSP Prime with 300nm Low Stress LPCVD Nitride
3566 76.2mm N P <100> 1--10 380um SSP Prime with 2,000nm Low Stress LPCVD Nitride
3567 76.2mm N P <100> 1--10 380um SSP Prime with 100nm Super Low Stress LPCVD Nitride
3568 76.2mm N P <100> 1--10 380um SSP Prime with 300nm Super Low Stress LPCVD Nitride
3569 76.2mm N P <100> 1--10 380um SSP Prime with 2,000nm Super Low Stress LPCVD Nitride

 

100mm (4 Inch) Nitride on Silicon

 

ID Diam Type Dopant Orien Res (Ohm-cm) Thick (um) Polish Grade Description
1911 100mm P B <100> 1--10 500um SSP Prime w/ 100nm of Standard LPCVD Nitride
1912 100mm P B <100> 0.001-0.005 500um SSP Prime with 100nm of Standard LPCVD Nitride
1913 100mm P B <100> 1--10 500um SSP Prime with 300nm of Standard LPCVD Nitride
1915 100mm N P <100> 1--10 500um SSP Prime with 100nm of Standard LPCVD Nitride
1917 100mm P B <100> 1--10 500um SSP Prime with 100nm of Low Stress LPCVD Nitride
1919 100mm N P <100> 1--10 500um SSP Prime with 100nm of Low Stress LPCVD Nitride
1921 100mm P B <100> 1--10 500um SSP Prime with 100nm Super Low Stress LPCVD Nitride
1922 100mm P B <100> 0.001-0.005 500um SSP Prime with 100nm Super Low Stress LPCVD Nitride
2898 100mm N P <100> 1--10 500um DSP Prime with 100nm Low-Stress LPCVD Nitride
3455 100mm P B <100> 1--10 500 SSP Prime with 500nm Low Stress LPCVD Nitride
3570 100mm P B <100> 1--10 500um SSP Prime with 300nm Low Stress LPCVD Nitride
3571 100mm P B <100> 1--10 500um SSP Prime with 2,000nm Low Stress LPCVD Nitride
3572 100mm P B <100> 1--10 500um SSP Prime with 300nm Super Low Stress LPCVD Nitride
3573 100mm P B <100> 1--10 500um SSP Prime with 2,000nm Super Low Stress LPCVD Nitride
3574 100mm N P <100> 1--10 500um SSP Prime with 300nm Standard LPCVD Nitride
3575 100mm N P <100> 1--10 500um SSP Prime with 300nm Low Stress LPCVD Nitride
3576 100mm N P <100> 1--10 500um SSP Prime with 2,000nm Low Stress LPCVD Nitride
3577 100mm N P <100> 1--10 500um SSP Prime with 100nm Super Low Stress LPCVD Nitride
3578 100mm N P <100> 1--10 500um SSP Prime with 300nm Super Low Stress LPCVD Nitride
3579 100mm N P <100> 1--10 500um SSP Prime with 2,000nm Super Low Stress LPCVD Nitride

 

150mm (6 Inch) Nitride on Silicon

 

ID Diam Type Dopant Orien Res (Ohm-cm) Thick (um) Polish Grade Description
3580 150mm P B <100> 1-100 625um SSP Prime with 100nm Standard LPCVD Nitride
3581 150mm P B <100> 1-100 625um SSP Prime with 300nm Standard LPCVD Nitride
3582 150mm P B <100> 1-100 625um SSP Prime with 100nm Low Stress LPCVD Nitride
3583 150mm P B <100> 1-100 625um SSP Prime with 300nm Low Stress LPCVD Nitride
3584 150mm P B <100> 1-100 625um SSP Prime with 2,000nm Low Stress LPCVD Nitride
3585 150mm P B <100> 1-100 625um SSP Prime with 100nm Super Low Stress LPCVD Nitride
3586 150mm P B <100> 1-100 625um SSP Prime with 300nm Super Low Stress LPCVD Nitride
3587 150mm P B <100> 1-100 625um SSP Prime with 2,000nm Super Low Stress LPCVD Nitride