What are Some Silicon Wafer Applications?

University Wafer Silicon Wafers and Semicondcutor Substrates Services
University Silicon Wafer for Production

What Wafer Spec Do You Need for Your Reesearch?

Just Ask Us!


What Wand Do you Use to Handle Silicon Wafers?

We sell wands. Let us know if you need.

polished silicon wafer wand tool

Silicon Wafers for Hydrophobic Coatings Research

Researchers have used the following substrates for hydrophobic coatings research.

Si Item #1196
100mm ANY ANY ANY >500um SSP MECH Grade

Waveguide Applications

We use it for waverguide applications,our partner want to take Siltronic brand,they already tested other brands,it failed,that's why they want to use Siltronic brand,can you see your way to get them?If you can get them,i can introduce it to our partner for trying one cassette for testing.Their purchase quantity is around 500-1000pcs annually.

UniversityWafer Quoted:

100mm FZ N(111) >12,000 ohm-cm 1,000um DSP
Bow <20um
TTV <10um

Call for pricing

Diced Silicon Wafers for Biosensor application

Researchers have used the following substrate for their biosensor research. Pricing depends on quantity.

10mm x 10mm, P/Boron, <100>, 1-10 ohm-cm, 525 ± 50 microns thick, silicon wafer chips

Let us know if you can use or if you need another spec.

 

What are Silicon Wafers are Used For Femtosecond Spectroscopy?

Silicon wafers are are ubiquitous in all electronics. Below is a silicon wafer diameters and their standard applications.

Clients have used the following Si Wafer Spec for femtosecond spectroscopy:

Silicon Item 3193: Silicon 100mm Undoped (100) DSP >10,000 ohm-cm 525um

Researchers experiment with the wafer above to generate high-field THz radiation, terahertz time-domain spectroscopy and ultrafast electro-optics.

Using images below, we will attempt to show you which applications Silicon Wafers are used in. Silicon Wafer Inventory Sale

  Wafer Diameter Applications
  <150mm 150mm 200mm 300mm        
Annealed Silicon Wafer     Yes Yes Memory LCD Driver Analog/Logic IC
 
Epi Silicon Wafer Yes Yes Yes Yes Power Devices Automobile Memory  
Polished Silicon Wafer Yes Yes Yes Yes Communications Power Devices MPU/MCU  
Diffused Silicon Wafer Yes Yes     Automobile Electricity Aerospace  
Non-polished Silicon Wafer Yes Yes     Discreet Devices
FZ Silicon Wafer Yes Yes Yes   Medical Equipment Wind Turbine High-Speed Rail Automobile
SOI Wafer Yes Yes Yes Yes High Voltage Power MEMS Sensor CMOS RF Devices

Research on Growth Mechanisms, Film Thickness, and Morphology Studied with UniversityWafer Silicon Wafers

Researchers from multiple major universities have used our products for their important research on deposition time. They used 500 um thick, P-type silicon wafers with a polymer like coating on top. These wafers were then used to investigate the atomic force microscopy.

Publication

Experimental Methods VUV Photo-polymerization

The reactor used for VUV photo-chemical experiments was similar to that of Truica-Marasescu et al. [6, 7, 16, 17] Briefly, it consisted of a stainless steel ‘‘cross’’ chamber, pumped down to high vacuum using a turbo-molecular pump supported by a two-stage rotary vane pump. The operating pressure during deposition was maintained near p = 15 Pa (112 mTorr). The flow rate of the hydrocarbon source gas C2H2 (99.6%, MEGS Inc., Montreal, QC, Canada), FC2H2, was kept constant at 10 sccm using a mass flow controller (Brooks Instruments, Hatfield, PA). The polymer-like [18] coatings resulting from the photo-chemical reactions were deposited on 500 μm-thick (100) p-type silicon wafers (University Wafer, Boston, MA, USA). The frontal distance between the substrate and the two different VUV sources was adjusted so that the total photon flux, Φ, interacting with the substrate was constant, Φ= 5.33 · 1014 ph/cm2/s. We used non-coherent commercial VUV (“KrL” and “XeL”) lamps (Resonance Ltd., Barrie, ON, Canada), based on an electrodeless radio-frequency (r.f., 100 MHz)-powered discharge plasma in krypton (Kr) or xenon (Xe) gas at low pressure: The Kr or Xe gas was contained in a Pyrex ampoule sealed with a MgF2 window (cut-off wavelength, λ = 112 nm), as described in further detail elsewhere [7, 16, 19]; the (resonant) emission wavelengths of the lamps were λKr = 123.6 nm (photon energy ca. 10 eV) and λXe = 147 nm (photon energy ca. 8.4 eV). The photon energies of both lamps were sufficient to break the C≡C bond in acetylene (bond energy ca. 8.3 eV). Five different treatment durations were studied, namely, 5, 10, 15, 20 and 30 min, in order to study the effect on film thickness, composition and growth. The experimental setup was housed inside a N2-filled glovebox, therefore inhibiting oxygen-induced ageing of the deposited films. X-ray Photoelectron Spectroscopy

Experimental Methods
VUV Photo-polymerization
The reactor used for VUV photo-chemical experiments was similar to that of Truica-Marasescu et al. [6, 7, 16, 17] Briefly, it consisted of a stainless steel ‘‘cross’’ chamber, pumped down to high vacuum using a turbo-molecular pump supported by a two-stage rotary vane pump. The operating pressure during deposition was maintained near p = 15 Pa (112 mTorr). The flow rate of the hydrocarbon source gas C2H2 (99.6%, MEGS Inc., Montreal, QC, Canada), FC2H2, was kept constant at 10 sccm using a mass flow controller (Brooks Instruments, Hatfield, PA). The polymer-like [18] coatings resulting from the photo-chemical reactions were deposited on 500 μm-thick (100) p-type silicon wafers (University Wafer, Boston, MA, USA). The frontal distance between the substrate and the two different VUV sources was adjusted so that the total photon flux, Φ, interacting with the substrate was constant, Φ= 5.33 · 1014 ph/cm2/s. We used non-coherent commercial VUV (“KrL” and “XeL”) lamps (Resonance Ltd., Barrie, ON, Canada), based on an electrodeless radio-frequency (r.f., 100 MHz)-powered discharge plasma in krypton (Kr) or xenon (Xe) gas at low pressure: The Kr or Xe gas was contained in a Pyrex ampoule sealed with a MgF2 window (cut-off wavelength, λ = 112 nm), as described in further detail elsewhere [7, 16, 19]; the (resonant) emission wavelengths of the lamps were λKr = 123.6 nm (photon energy ca. 10 eV) and λXe = 147 nm (photon energy ca. 8.4 eV). The photon energies of both lamps were sufficient to break the C≡C bond in acetylene (bond energy ca. 8.3 eV). Five different treatment durations were studied, namely, 5, 10, 15, 20 and 30 min, in order to study the effect on film thickness, composition and growth.
The experimental setup was housed inside a N2-filled glovebox, therefore inhibiting oxygen-induced ageing of the deposited films.
X-ray Photoelectron Spectroscopy.

 

UniversityWafer Silicon Wafers Used Research on Nanopatterned Antimicrobial Enzymatic Surfaces

Researchers from Duke University purchased 25 mm x 50 mm silicon wafers with a thickness of 0.13 mm for the purpose of studying the sequential biocidal activity and fouling-release of SEM.

Silicon Wafers Used for Multiresonant Layered Plasmonic Films

We have gold coated silicon wafers cleaned with oxygen plasma to create a hydrophilic surface.

Cleaving a Silicon Wafer To Collect Raman spectra

Researchers have used our Mono-crystalline silicon wafers to collect raman spectra.

The wafers were 2” in diameter with a nominal thickness of 280 micron and a (100) lattice
plane orientation.  Thicker 300 and 500 micron wafers with orientations (110) and (111) that were undoped and ingle side polished were also used.

Before cleaving, a mask is placed over the wafer to match the wafer's cleavage plane. A diamond scribe is used to etch the wafer along the mask. A pair of tweezers is then used to hold the larger half of the wafer in place. The wafer is snapped along the scribed edge. An illustrative tutorial of this process is given by Prime Wafers, and a useful reference for silicon's crystalline. Once cleaved, the wafer sections are dusted and cleaned with a lab tissue and isopropanol. Cleaved wafers are stored in small plastic cases with a cushion of lab tissue. In preparation of capturing spectra, wafers are delicately handled with a pair of tweezers or gloved hands and are cleaned again with isopropanol.

Biohybrid Photovoltaic Devices

P-type silicon wafers and ITO Coated Glass Slides that were 25mm x 50mm were used in the research.

What Wafers Can Be Used for Silicon Air Battery Research?

Researchers have used Arsenic (As) and Boron (B) doped silicon wafers to research the incredible promis of silicon-air batteries.

The following wafer specs were used in the experiment.

Item# EF76b: Silicon wafers, per SEMI Prime, P/E 4"Ø×3,000±25µm,Quantity=1 n-type Si:As[100]±0.5°, Ro=(0.001-0.005)Ohmcm, One-side-polished, back-side Alkaline etched, SEMI Flats (two),
Sealed in Individual Wafer cassette.

Item# 2357: Silicon wafers 100mm P/B <110> 1-10 ohm-cm, 500um, SSP Prime

Analysis on discharge behavior and performance of As- and B-doped silicon anodes in non-aqueous Si–air batteries under pulsed discharge operation

Full Article

Highly As- and B-doped single-crystalline silicon wafers (University Wafer, USA) with specifications as listed in Table 1, were cut into 12 × 12 mm sized squared pieces to be used as anodes. Before the electrochemical measurements, the anode surfaces were treated with plasma (PICO, Diener). A two-step plasma treatment was applied to Si wafers to volatilize organic contaminations and to remove the native oxide layer on the silicon surfaces. First, a treatment with oxygen/argon plasma (60% O2/40% Ar) was employed, which was followed by an argon/sulfur hexafluoride plasma (50% SF6/46% Ar/4% O2). A room temperature ionic liquid EMIm(HF)2.3F from Morita Chemical Industries, Japan was used as an electrolyte without further treatment. Commercial air-electrodes (E4b type, Electric Fuel Ltd., Israel) consisting of a stainless-steel mesh embedded into carbon black with manganese dioxide catalyst were used for air cathodes. The air side of these cathodes is covered with a Teflon layer.

Silicon Used in the Microfabrication for Biomedical Research

Principal research investigators have used the following test grade silicon wafers in their fluid mechanics and electrodynamics research. Specifically, researchers used substrate item #452 to developed systems that manipulate magnetic microparticles in microfluidic channels. The applications includude microfluidic lab-on-a-chip devices, particle sorting and coating, and to measure ultralow interfacial tensions.

Item #452 - 100mm P(100) 0-100 ohm-cm SSP 500um Virgin Test Grade

Silicon Wafers in-situ ATR-FTIR measurements 

A scientistst was looking for silicon wafers that will serve as the ‘window’ to a pouch battery be used for Attenuated Total Reflectance−Fourier Transform Infrared Spectroscopy (ATR-FTIR) .

attenuated total reflectance-fourier transform infrared spectroscopy

Researcher

"I am looking for silicon wafer that will serve as the ‘window’ to a pouch battery for in-situ ATR-FTIR measurements (see schematic below). I was wondering if item 2018 would be suitable for this purpose? Item# 2018 Item# 3193."

We replied that yes any of those item would work!

What Silicon Wafer Specs Should I use to Monitor Airborne PDMS Contamination?

A scientist requested the following help:

Can you help me choose the best silicon wafer grade to monitor airborne PDMS contamination? We need a clean surface to work with, in other words, we don't want to worry about the wafer cleanliness as received and we don't want to clean them. So is Test Grade good for us? Or do we have to go for the Semi-Prime Grade?

UniversityWafer, Inc. quoted the following:

150mm P/B (100) 1-10 ohm-cm 650+/-25um SSP PRIME GRADE