We sell wands. Let us know if you need.
Researchers have used the following substrates for hydrophobic coatings research.
Si Item #1196
100mm ANY ANY ANY >500um SSP MECH Grade
We use it for waverguide applications,our partner want to take Siltronic brand,they already tested other brands,it failed,that's why they want to use Siltronic brand,can you see your way to get them?If you can get them,i can introduce it to our partner for trying one cassette for testing.Their purchase quantity is around 500-1000pcs annually.
UniversityWafer Quoted:
100mm FZ N(111) >12,000 ohm-cm 1,000um DSP
Bow <20um
TTV <10um
Call for pricing
Researchers have used the following substrate for their biosensor research. Pricing depends on quantity.
10mm x 10mm, P/Boron, <100>, 1-10 ohm-cm, 525 ± 50 microns thick, silicon wafer chips
Let us know if you can use or if you need another spec.
Silicon wafers are are ubiquitous in all electronics. Below is a silicon wafer diameters and their standard applications.
Clients have used the following Si Wafer Spec for femtosecond spectroscopy:
Silicon Item 3193: Silicon 100mm Undoped (100) DSP >10,000 ohm-cm 525um
Researchers experiment with the wafer above to generate high-field THz radiation, terahertz time-domain spectroscopy and ultrafast electro-optics.
Using images below, we will attempt to show you which applications Silicon Wafers are used in.
Wafer Diameter | Applications | |||||||
---|---|---|---|---|---|---|---|---|
<150mm | 150mm | 200mm | 300mm | |||||
Annealed Silicon Wafer | Yes | Yes | Memory | LCD Driver | Analog/Logic IC |
|||
Epi Silicon Wafer | Yes | Yes | Yes | Yes | Power Devices | Automobile | Memory | |
Polished Silicon Wafer | Yes | Yes | Yes | Yes | Communications | Power Devices | MPU/MCU | |
Diffused Silicon Wafer | Yes | Yes | Automobile | Electricity | Aerospace | |||
Non-polished Silicon Wafer | Yes | Yes | Discreet Devices | |||||
FZ Silicon Wafer | Yes | Yes | Yes | Medical Equipment | Wind Turbine | High-Speed Rail | Automobile | |
SOI Wafer | Yes | Yes | Yes | Yes | High Voltage Power | MEMS Sensor | CMOS | RF Devices |
Researchers from multiple major universities have used our products for their important research on deposition time. They used 500 um thick, P-type silicon wafers with a polymer like coating on top. These wafers were then used to investigate the atomic force microscopy.
The reactor used for VUV photo-chemical experiments was similar to that of Truica-Marasescu et al. [6, 7, 16, 17] Briefly, it consisted of a stainless steel ‘‘cross’’ chamber, pumped down to high vacuum using a turbo-molecular pump supported by a two-stage rotary vane pump. The operating pressure during deposition was maintained near p = 15 Pa (112 mTorr). The flow rate of the hydrocarbon source gas C2H2 (99.6%, MEGS Inc., Montreal, QC, Canada), FC2H2, was kept constant at 10 sccm using a mass flow controller (Brooks Instruments, Hatfield, PA). The polymer-like [18] coatings resulting from the photo-chemical reactions were deposited on 500 μm-thick (100) p-type silicon wafers (University Wafer, Boston, MA, USA). The frontal distance between the substrate and the two different VUV sources was adjusted so that the total photon flux, Φ, interacting with the substrate was constant, Φ= 5.33 · 1014 ph/cm2/s. We used non-coherent commercial VUV (“KrL” and “XeL”) lamps (Resonance Ltd., Barrie, ON, Canada), based on an electrodeless radio-frequency (r.f., 100 MHz)-powered discharge plasma in krypton (Kr) or xenon (Xe) gas at low pressure: The Kr or Xe gas was contained in a Pyrex ampoule sealed with a MgF2 window (cut-off wavelength, λ = 112 nm), as described in further detail elsewhere [7, 16, 19]; the (resonant) emission wavelengths of the lamps were λKr = 123.6 nm (photon energy ca. 10 eV) and λXe = 147 nm (photon energy ca. 8.4 eV). The photon energies of both lamps were sufficient to break the C≡C bond in acetylene (bond energy ca. 8.3 eV). Five different treatment durations were studied, namely, 5, 10, 15, 20 and 30 min, in order to study the effect on film thickness, composition and growth. The experimental setup was housed inside a N2-filled glovebox, therefore inhibiting oxygen-induced ageing of the deposited films. X-ray Photoelectron Spectroscopy
Experimental Methods
VUV Photo-polymerization
The reactor used for VUV photo-chemical experiments was similar to that of Truica-Marasescu et al. [6, 7, 16, 17] Briefly, it consisted of a stainless steel ‘‘cross’’ chamber, pumped down to high vacuum using a turbo-molecular pump supported by a two-stage rotary vane pump. The operating pressure during deposition was maintained near p = 15 Pa (112 mTorr). The flow rate of the hydrocarbon source gas C2H2 (99.6%, MEGS Inc., Montreal, QC, Canada), FC2H2, was kept constant at 10 sccm using a mass flow controller (Brooks Instruments, Hatfield, PA). The polymer-like [18] coatings resulting from the photo-chemical reactions were deposited on 500 μm-thick (100) p-type silicon wafers (University Wafer, Boston, MA, USA). The frontal distance between the substrate and the two different VUV sources was adjusted so that the total photon flux, Φ, interacting with the substrate was constant, Φ= 5.33 · 1014 ph/cm2/s. We used non-coherent commercial VUV (“KrL” and “XeL”) lamps (Resonance Ltd., Barrie, ON, Canada), based on an electrodeless radio-frequency (r.f., 100 MHz)-powered discharge plasma in krypton (Kr) or xenon (Xe) gas at low pressure: The Kr or Xe gas was contained in a Pyrex ampoule sealed with a MgF2 window (cut-off wavelength, λ = 112 nm), as described in further detail elsewhere [7, 16, 19]; the (resonant) emission wavelengths of the lamps were λKr = 123.6 nm (photon energy ca. 10 eV) and λXe = 147 nm (photon energy ca. 8.4 eV). The photon energies of both lamps were sufficient to break the C≡C bond in acetylene (bond energy ca. 8.3 eV). Five different treatment durations were studied, namely, 5, 10, 15, 20 and 30 min, in order to study the effect on film thickness, composition and growth.
The experimental setup was housed inside a N2-filled glovebox, therefore inhibiting oxygen-induced ageing of the deposited films.
X-ray Photoelectron Spectroscopy.
Researchers from Duke University purchased 25 mm x 50 mm silicon wafers with a thickness of 0.13 mm for the purpose of studying the sequential biocidal activity and fouling-release of SEM.
We have gold coated silicon wafers cleaned with oxygen plasma to create a hydrophilic surface.
Researchers have used our Mono-crystalline silicon wafers to collect raman spectra.
The wafers were 2” in diameter with a nominal thickness of 280 micron and a (100) lattice
plane orientation. Thicker 300 and 500 micron wafers with orientations (110) and (111) that were undoped and ingle side polished were also used.
P-type silicon wafers and ITO Coated Glass Slides that were 25mm x 50mm were used in the research.
Researchers have used Arsenic (As) and Boron (B) doped silicon wafers to research the incredible promis of silicon-air batteries.
The following wafer specs were used in the experiment.
Item# EF76b: Silicon wafers, per SEMI Prime, P/E 4"Ø×3,000±25µm,Quantity=1 n-type Si:As[100]±0.5°, Ro=(0.001-0.005)Ohmcm, One-side-polished, back-side Alkaline etched, SEMI Flats (two),
Sealed in Individual Wafer cassette.
Item# 2357: Silicon wafers 100mm P/B <110> 1-10 ohm-cm, 500um, SSP Prime
Principal research investigators have used the following test grade silicon wafers in their fluid mechanics and electrodynamics research. Specifically, researchers used substrate item #452 to developed systems that manipulate magnetic microparticles in microfluidic channels. The applications includude microfluidic lab-on-a-chip devices, particle sorting and coating, and to measure ultralow interfacial tensions.
Item #452 - 100mm P(100) 0-100 ohm-cm SSP 500um Virgin Test Grade
A scientistst was looking for silicon wafers that will serve as the ‘window’ to a pouch battery be used for Attenuated Total Reflectance−Fourier Transform Infrared Spectroscopy (ATR-FTIR) .
Researcher
"I am looking for silicon wafer that will serve as the ‘window’ to a pouch battery for in-situ ATR-FTIR measurements (see schematic below). I was wondering if item 2018 would be suitable for this purpose? Item# 2018 Item# 3193."
We replied that yes any of those item would work!
A scientist requested the following help:
Can you help me choose the best silicon wafer grade to monitor airborne PDMS contamination? We need a clean surface to work with, in other words, we don't want to worry about the wafer cleanliness as received and we don't want to clean them. So is Test Grade good for us? Or do we have to go for the Semi-Prime Grade?
UniversityWafer, Inc. quoted the following: