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Compared to gas diffusion doping, Spin-on doping uniformity is better. The variance across a wafer is between 0.5% and 1% and variance from wafer to wafer ranges between 1% - 2%.
Spin on glass (SOG) mixes SiO2 and either boron or phosphorous. The mixture is suspended in a solvent solution. SOG should only be spin-coated onto a particle free silicon.
Semiconductor applications for Spin-On Glass include, but are not limited to the following: