An application scientist requested a quote for the following.
I am looking to source some custom made patterned ITO wafers. We are developing a new calibration product for optical microscopes, and need a very specific pattern of ITO on a glass substrate. Can you provide this type of service, and if not, could you recommend to me any suggestions?
We don't have a mask but would like the patterning to be based upon a standard resolution target called the '1951 USAF target'. Also, it's important for the glass substrate to be optically flat, with similar properties to so called 'parallel-optical flats' (lambda/20 flatness). We can provide these if necessary, but do you have any specs on the substrate. flatness? Finally, can we'd like to vary the ITO thickness from ~10 nm to ~ 100 nm either over different regions of the same wafer, or over several different wafers. Is this something that you could do for us?
Reference #187783 for specs and pricing.
ITO Wafers for Spin Curve Testing
A PhD candidate requested a quote for the following.
I am looking for basic ITO coated glass wafers 6" in diameter. Thickness is not really an issue for me and shouldn’t change the properties of the spin curve, so whatever is the standard thickness and/or cheaper., for basic spin curve testing.
Reference #125399 specs and pricing.
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Indium-tin-oxide (ITO) coated substrates
ITO high light transmission and high-conductivity are great for Liquid Crystal Displays (LCD).
Bare (unpatterned) indium-tin-oxide (ITO) glass
(e.g. 15 ohm/sq.; 25 mm x 25 mm; < USD 1.5)
Patterned indium-tin-oxide (ITO) glass
(e.g. 15 ohm/sq.; 25 mm x 25 mm; < USD 1.5)
Bare ITO coated plastic film [PET, PEN]
Patterned ITO coated plastic films [PET, PEN]
Discount 60 ohm/sq ITO coated PET film (0.125mm)
ITO glass Specifications
Product configuration
Glass / SiO2 buffer (~23 nm) / ITO
ITO coating
Magnetron sputtering
ITO patterning
Photolithography
Size
Any size up to 14â€x 16â€
Typical sheet resistance
(ohm/sq)
6, 10, 13, 15, 20, 60, 100, 250, etc
(Others are also available for volume production)
Substrate thickness (mm)
0.4, 0.55, 0.7, and 1.1
Pre-patterned
Via photofilm or Cr mask
ITO plastic film
Specifications
Product configuration
Polyethylene terephthalate (PET) / ITO
< 0.5
Product features
Color neutral, low emissivity
Durable pyrolytic (hard coat) surface
Bendable
Nippon Sheet Glass FTO
for solar applications
Specifications
FTO glass manufacturer
Nippon Sheet Glass Co. Ltd., Japan
Size
<= 14†x 16†or 300mm x 300mm
Typical sheet resistance (ohm/sq)
< 7 and 13
Substrate
Soda lime float glass
Substrate thickness (mm)
2.2 and 3.1 +/- 0.2
Visible transmission
> 77 %
Haze
>8 %
Normal FTO glass
Specifications
FTO glass manufacturing
PRC
Size
Any size up to 300mm x 300mm
Typical sheet resistance (ohm/sq)
<15
Substrate Clear soda lime float glass
Substrate thickness
2.2 mm
Remark: Customer services including patterning are available. We can offer patterning service for your ITO substrates.
What Is Spin Curve Testing?
Spin Curve Testing
Spin curve testing is a characterization method used in spin coating to determine the relationship between spin speed and film thickness for a given resist or coating material.
Purpose of Spin Curve Testing
Establish the optimal spin speed for achieving a desired film thickness.
Ensure uniform film thickness across the wafer.
Optimize process parameters for photoresists, sol-gels, polymers, or other thin films.
Determine the coating behavior of new materials.
How It Works
Prepare the Substrate:
Use a clean silicon wafer, glass, or other substrate.
Ensure the surface is dry and free of contaminants.
Dispense the Material:
Apply a fixed volume of photoresist, polymer, sol-gel, or another coating solution at the wafer center.
Spin at Different Speeds:
Perform spin coating at multiple speeds (e.g., 500–5000 rpm).
Use an ellipsometer, profilometer, or interferometric method to measure thickness after each spin.
Plot the Spin Curve:
Graph thickness vs. spin speed on a log-log plot.
The relationship follows the empirical equation:
t=k⋅ω−nt = k \cdot \omega^{-n} t = k ⋅ ω −n
where:
tt t = film thickness
kk k = material constant
ω\omega ω = spin speed (rpm)
nn n = spin exponent (typically 0.5–0.7 for Newtonian fluids)
Interpreting the Spin Curve
Higher spin speeds = Thinner films (due to higher centrifugal force).
Lower spin speeds = Thicker films (due to reduced solvent evaporation).
Deviations from the expected curve indicate issues like solvent drying too fast, poor viscosity control, or uneven dispensing.
Applications
Photoresist coating in lithography.
Dielectric & polymer coatings in semiconductor processing.
Optical coatings (e.g., sol-gel for anti-reflection layers).
Biosensor & MEMS coatings.
Would you like help analyzing a specific spin curve dataset?
ITO Coated Glass Wafers
A postdoc requested a quote for the following.
I am interested in glass wafer coated with ITO. In
your website I found these options
ITO Wafers
< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.55mm
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 1.1mm
The number before the price is the minimum number
of wafers for a single order or indicates the
price range.
I am asking because I prefer the second kind of
wafers but I need no more than 10.
Reference #180192 for specs and pricing.
ITO Wafers for Nanoimprint Lithography Applications
A graduate student requested a quote for the following.
I am interested in purchasing ITO wafers, and I have a few questions regarding the specs. Can you give me a figure for the surface roughness on both sides of the glass wafer? I need both surfaces to be as smooth as possible, less than 1nm of surface roughness (Ra), for nanoimprint lithography application.
Please let me know if you see ITO wafers of this surface quality.
Reference #203125 for specs and pricing.
ITO Wafers Transmission Curve
A PhD candidate requested a quote for the following.
I am interested in square ITO wafers features on your website :
7 ohm/sq ITO coated polished glass Size: 50mm x 50mm, 700um thick (ID 2291)
7 ohm/sq ITO coated polished glass Size: 100mm x 100mm, 700um thick (ID 2292)
There are some questions I want to ask before ordering:
Do you offer a choice of glass type (D263, BK7, etc.)?
What are the tolerances on the mentioned dimensions and thickness?
Is there ITO on all the surface of the wafers or is there a zone without coating near the edges?
Do you have a transmission curve of this particular ITO thickness (7ohm/sq)?
Reference #209660 for specs and pricing.
What is ITO Thin Film?
An ITO (indium tin oxide) thin film is a type of transparent conductive film that is commonly used in a variety of electronic devices, including smartphones, tablets, and LCD (liquid crystal display) televisions. ITO thin films are made by depositing a thin layer of indium tin oxide onto a substrate, such as glass or plastic.
One of the key properties of ITO thin films is their ability to conduct electricity while also being transparent. This makes them ideal for use in devices that require both electrical conductivity and the ability to display images or other information to the user.
In addition to their use in display technology, ITO thin films are also used in a variety of other applications, including solar cells, touch screens, and EMI (electromagnetic interference) shielding.
There are a number of different methods that can be used to create ITO thin films, including sputtering, evaporation, and chemical vapor deposition. The specific method chosen will depend on the desired properties of the film and the requirements of the application.
What is ITO Coating?
ITO (indium tin oxide) coating is a thin layer of material that is applied to a surface to create an electrically conductive layer. ITO coatings are often used in electronic devices, such as smartphones, tablets, and LCD displays, to provide electrical conductivity to the device's touch screen.
ITO coatings are transparent, allowing light to pass through them, which makes them well-suited for use in displays. They are also highly conductive, which allows them to transmit electrical signals with minimal resistance. In addition, ITO coatings are durable and resistant to wear, which makes them ideal for use in touch screens that are subjected to frequent use.
ITO coatings are typically applied using a sputtering process, in which a thin layer of ITO is deposited onto the surface of the device using high-energy particles. The ITO coating is then patterned and etched to create the desired electrical connections and touch-sensitive areas.
Overall, ITO coatings are an important component of many electronic devices, as they enable the device to function as a touch screen and interact with users through electrical signals.
10 ohm/sq ITO coated polished glass Size: 150mm x 150mm Specify thickness 1.1 or 0.7mm
< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.55mm
10 $65.90 each
25 $55.90 each
50 $47.90 each
100 $43.00 each
----------
<20 ohm/sq ITO coated SiO2 wafer
ITO thickness: ~ 100nm +/-10nm
Surface: Polished grade
Size: 4" dia. x 1.1mm
25 $34.90 each
50 $30.90 each
100 $25.90 each
----------
<20 ohm/sq ITO coated SiO2 wafer
ITO thickness: ~ 100nm +/-10nm
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $38.90 each
50 $34.90each
100 $30.90 each
----------
< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 1.1mm
25 $38.90 each
50 $34.90each
100 $30.90 each
----------
< 10 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $43.00 each
50 $38.90each
100 $34.90 each
----------
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 1.1mm
25 $43.00 each
50 $38.90each
100 $34.90 each
----------
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $43.00 each
50 $38.90each
100 $34.90 each
----------
<7 ohm/sq ITO coated SiO2 wafer
Surface: Polished grade
Size: 4" dia. x 0.7mm
25 $51.90 each
50 $43.00 each
100 $38.90 each
Indium Tin Oxide (ITO) Coated PET Sheet
Coating Properties:
Specified ITO Sheet resistivity – ≤ 15 ohms/sq
Typical ITO Sheet resistivity – 8 10 ohms/sq
Transmittance at 550nm – ≥ 75%
ITO film Thickness – 1400-1500 Å
Sheet Thickness – 0.175 mm or 175 micron
Haze – NA
Heat resistance (R/R0) - ≤1.3 (@130°C, 30min)
Hear storage (R/R0) - ≤1.3 (@90°C x 250hrs)
High humidity storage (R/R0) - ≤1.3 (@60°C x 250hrs, 95% RH)
Heat cycle (R/R0) - ≤1.3 (@-30°C 85°C x 50 cycle)
Adhesive- Excellent (@1.0kg x 25 cycle with cloth)
Surface check - Smooth, no holes, no patches and no stain
Storage temperature - -30°C +40°C
Brand – UniversityWafer, Inc.
Physical Properties:
Configuration – Polyethylene terephthalate (PET) / ITO
Substrate – Optical clear grade PET film / Hardcoated PET film
Surface finished of glass – N/A
Passivation layer – No
ITO coating method – Magnetron sputtering at elevated temperature under vacuum
ITO work function – 4.8 4.9eV (measured by UPS) after proper cleaning
Surface Roughness – RMS1 10 nm, depend on the various product
Packing - Sheet/roll form
Indium Tin Oxide (ITO) Coated PET Sheet Product Series: TIPZ
Coating Properties:
Specified ITO Sheet resistivity – 60 ohms/sq
Typical ITO Sheet resistivity – 70 ohms/sq
Transmittance @ 550nm – ≥ 8 %
ITO film Thickness 350 to 370 Å
Sheet Thickness – 0.175 mm or 175 micron
Haze – NA
Heat resistance (R/R0) - ≤1.3 (@13 °C, 30min)
Hear storage (R/R0) - ≤1.3 (@9 °C x 250hrs)
High humidity storage (R/R0) - ≤1.3 (@6 °C x 250hrs, 95% RH)
Heat cycle (R/R0) - ≤1.3 (@-30°C 85°C x 50 cycle)
Adhesives - Excellent (@1.0kg x 25 cycle with cloth)
Surface check - Smooth, no holes, no patches and no stain
Storage temperature - -30°C +40°C
Brand – UniversityWafer, Inc.
Physical Properties:
Configuration – Polyethylene terephthalate (PET) / ITO
Substrate – Optical clear grade PET film / Hardcoated PET film
Surface finished of glass – N/A
Passivation layer – No
ITO coating method – Magnetron sputtering at elevated temperature under vacuum
ITO work function – 4.8 4.9eV (measured by UPS) after proper cleaning
Surface Roughness – RMS1 10 nm, depending on the various product
Packing - Sheet/roll form
What are ITO Wafers Used for?
Indium tin oxide (ITO) wafers are thin sheets of material made from a mixture of indium and tin oxide. They are used in a variety of electronic and optoelectronic applications due to their high conductivity, transparency, and ability to be easily patterned.
One of the main uses of ITO wafers is in the manufacture of touch screens for electronic devices, such as smartphones and tablets. The ITO wafer is typically coated onto a glass or plastic substrate to create a touch-sensitive surface that can detect the location and movement of a user's finger. The ITO coating is then patterned and etched to create the desired electrical connections and touch-sensitive areas.
ITO wafers are also used in the manufacture of LCD (liquid crystal display) screens, which are found in a wide range of electronic devices, including TVs, computer monitors, and laptops. The ITO wafer is used to create the transparent electrode layer that is required for the LCD screen to function.
In addition to their use in touch screens and LCD displays, ITO wafers are also used in a variety of other electronic and optoelectronic applications, such as solar cells, LED lighting, and thin film transistors. They are also used in the manufacture of a range of other electronic components and devices, including sensors, detectors, and RFID (radio-frequency identification) tags.
How can indium tin oxide be conductive and transparent at the same time?
Indium Tin Oxide (ITO) is both conductive and transparent due to its unique electronic band structure and optical properties.
1. Transparency
ITO is a wide-bandgap semiconductor with a bandgap of around 3.5–4.3 eV. This means:
Visible Light Passes Through: The bandgap is larger than the energy of visible light (~1.8–3.1 eV), so photons in the visible spectrum do not have enough energy to excite electrons from the valence band to the conduction band. As a result, visible light is not absorbed and ITO appears transparent.
Absorbs in UV & Reflects IR: Higher-energy UV photons can excite electrons across the bandgap, making ITO absorbent in the UV range. Additionally, free electrons in the conduction band interact with lower-energy IR photons, leading to high reflectance in the infrared.
2. Conductivity
ITO is conductive due to its high carrier concentration:
Doped Semiconductor Behavior: Tin (Sn) dopants introduce extra free electrons into the conduction band (n-type doping), making ITO a highly degenerate semiconductor.
Metallic-like Conductivity: The high electron concentration (~1020−102110^{20} - 10^{21} 10 20 − 10 21 cm−3^{-3} −3) causes ITO to behave similarly to metals in terms of electrical conductivity.
Low Electron Scattering: The structure allows for relatively low electron scattering, ensuring good conductivity while maintaining transparency.
3. Balancing Transparency and Conductivity
There is a trade-off:
Higher doping increases conductivity but can reduce transparency due to free carrier absorption and plasmonic effects in the near-infrared.
Lower doping improves transparency but decreases conductivity.
This balance makes ITO an ideal transparent conductive oxide (TCO), commonly used in touchscreens, solar cells, and display technologies.
You said:
How does one etch an indium-tin oxide?
ChatGPT said:
Etching Indium Tin Oxide (ITO) can be challenging due to its chemical resistance, but several methods exist, each with different advantages depending on precision, selectivity, and process compatibility. Here are the main approaches:
1. Wet Chemical Etching
Wet etching is commonly used for ITO patterning because of its simplicity and cost-effectiveness.
Common Etchants:
Hydrochloric Acid (HCl) + Nitric Acid (HNO₃) (or Aqua Regia)
Reaction: In2O3+6HCl→2InCl3+3H2O\text{In}_2\text{O}_3 + 6HCl \rightarrow 2InCl_3 + 3H_2O In 2 O 3 + 6HCl → 2InCl 3 + 3H 2 O SnO2+4HCl→SnCl4+2H2O\text{SnO}_2 + 4HCl \rightarrow SnCl_4 + 2H_2O SnO 2 + 4HCl → SnCl 4 + 2H 2 O
Pros: Fast and effective.
Cons: Aggressive, requires careful handling.
Example Mixtures:
HCl : HNO₃ : H₂O (4:1:40)
HCl (37%) at 50–60°C for faster etching.
Ferric Chloride (FeCl₃)
Pros: Less aggressive than acid mixtures.
Cons: Leaves Fe residues, requiring additional cleaning.
Oxalic Acid (C₂H₂O₄)
Pros: Good selectivity for ITO over some substrates.
Cons: Slower etching rate.
Process Considerations:
Heat the etchant to 40–60°C to increase etch rate.
Use photoresist as a mask (positive resist for selective etching).
Post-etch rinse with DI water to remove residues.
2. Dry Etching (Plasma or RIE)
Reactive ion etching (RIE) is preferred for high-resolution ITO patterning.
Common Gases for ITO RIE:
BCl₃ / Cl₂ / Ar (Chlorine-based)
Forms volatile InCl₃ and SnCl₄, which are easily removed.
