Silicon wafers with gold deposited onto the surface are used in soft lithography for micro and nanoscale patterning.
Deposition Technique: Electron Beam
Deposition Rate: 1-2 Å/sec
Vapor Pressure: 10-6 Torr
Adhesion Layer: Cr (99.99%)
We have gold coated Si wafers and we can deposit gold onto most any substrate. A thin layer of titanium (Ti) is used as an adhesion layer so the gold easily bonds to the single crystal silicon wafer.
Please email the specs and quantity that you would like.