N-type Silicon Wafers for Research & Production
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N-Type Silicon Wafers to Fabricate Low Cost Photodetectors
The following n-type silicon wafers were used to fabricate low-cost UV-Visible broadband photodetectors. Research has discovered many new and wide ranging applications.
Si Item #589 - 100mm N/Ph (100) 1-10 ohm-cm DSP 500um Prime Grade
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Below are just one of the wafer specs that we have on sale!
- 1" Undoped Silicon (100) >1,000 ohm-cm 250um DSP
- 2" P/Boron (100) 1-10 ohm-cm 280um SSP
- 3" N/Phosphorus (100) 0.01-0.02 ohm-cm 380um DSP
- 4" Intrinsic Silicon (100) >20,000 ohm-cm 500um DSP
- 6" P/B (111) <1 ohm-cm 300um SSP
- 8" Intrinsic (100) >5,000 ohm-cm 750um SSP
- 12" P/B (100) 10-20 ohm-cm DSP 850um
We have plenty of silicon wafers at a low price and small quantitiesof partial cassettes so you can buy less than 25 wafers and as few as one Si wafer.
We carry a large selection of Silicon wafers with:
Retinal Cells Cultured on Silicon Nanowire by Using UniversityWafer N-type phosphorus substrate
Researchers from Sweden have used our products as their silicon substrate controls. To help their work, flat silicon, phosphorus doped wafers with a resistivity of 1-10 Ohm-cm were used. This was a control substrate. The overall goal of the research was to find a way to deliver drugs to retinal cells for growth.
Silicon Substrate Controls
Control substrates, denominated flat silicon (“flat Si” or “Si flat” in Figures) consisted of (100) n-type (phosphorus) silicon wafers with a resistivity of 1–10 Ohm cm (University Wafer).
Silicon Nanowire Substrate
Si NW substrates were prepared by metal assisted chemical etching (MACE) of crystalline silicon in hydrofluoric acid (HF)/silver nitrate (AgNO3) aqueous solution, as previously described.16 In brief, silicon wafers [as those used as controls: (100) n-type (phosphorus), resistivity of 1–10 Ohm cm], were cleaned in acetone and isopropanol, rinsed in Milli-Q water and immersed in a piranha solution (3[thin space (1/6-em)]:[thin space (1/6-em)]1 concentrated H2SO4[thin space (1/6-em)]:[thin space (1/6-em)]30% H2O2) for 15 min at 80 °C, followed by copious rinsing in Milli-Q water. Arrays of Si NW were obtained by chemical etching of the substrate in HF/AgNO3 (6.3 M/0.02 M) Milli-Q water solution at 55 °C for 10 min. Silver was removed by immersing the substrates in two successive 4 hour-long baths of nitric acid (HNO3) at room temperature, rinsing in Milli-Q running flow during 1 min and further rinsing in a Milli-Q water bath overnight. Fig. 1 shows scanning electron microscopy (SEM) images of the main type of Si NW substrates used in this study, with 4.4 μm long nanowires of diameter ranging from 20 to 120 nm. Nanowires of different lengths (200 nm, 800 nm and 1.8 μm) were also prepared with 1 min, 3 min and 6 min etching durations, respectively.
N-Type Silicon Substrates
See below for a short list of our n-type silicon wafers
N-type Silicon
Si Item #2270 - 50.8mm N-type Arsenic Doped (100) 0.001-0.005 ohm-cm 280um SSP Prime $6.90 In stock
Si Item #695 - 76.2mm N-type Phosphorous Doped (100) 1-10 ohm-cm 380um SSP Prime $9.90 In stock
Si Item #2462 - 100mm N-type Phosphorus Doped (100) 10-20 ohm-cm 280um DSP Prime $13.90 In stock
Si Item #2509 - 150mm N-type Antimony Doped (Sb) (111) 0.008-0.02 ohm-cm 675um SSP $9.90 In stock
Si Item #2518 - 200mm N-type Phosphorus Doped (100) 24-36 ohm-cm 725um SSP $19.90 In stock
Buy as few as one silicon n-type wafer!
Special!
FZ 6"Ø×25mm n-type Si:P[100],(7,025-7,865)Ohmcm, 1 SEMI Flat We have a large selection of Prime, Test and Mechanical Grade Undoped, Low doped and Highly doped Silicon wafers 1" - 12" Silicon Wafers low doped and highly doped in stock and ready to ship. Examples full and partial silicon wafer cassettes include:
Typical Client Question regarding silicon wafers:
After looking at your online store, I think we might go with your cheapest silicon wafers, product ID 444. I am in a group that is working on a Senior Design Project to create a biobattery. We need a substrate to pattern with photolithography and subsequently deposit various precious metals on that will catalyze certain reactions and conduct electricity. If you have any advice on specific types of wafers we will need for such nano electronic devices I would be happy to know. Thanks.
We make nanomaterials in our lab and one approach is using electrical explosion of wires (EEW). We used one of Scott's old Si wafers (doped with B) and broke off a strip of Si that we attached to electrodes in our EEW apparatus. It worked nicely and we are looking to do the same thing with Ge (Germanium Wafer). We need a wafer that is less than 500 microns thick. Fill out the form and receive an immediate quote. See bottom of page for recent Silicon Wafers specials.
What is surface flatness of silicon wafer?
We have Ultra-Flat Silicon with the following spec
Prime Silicon Wafers 100mm P-type /Boron doped <1-0-0> 490-510 micron 0.005-.020 ohm-cm Semi Std Double Side Polished Total Thickness Variation (TTV)<1 um. These are great for making SOI or MEMS!
What is the roughness value (rms) silicon wafer?
The majority of our Prime Grade wafers have a roughness value Ra<5Å.
What is the definition of silicon wafers?
A Si wafer, or substrate, or silicon is grown in a tube from a seed into a long ingot that is then sliced into various thicknesses used in electronics for the fabrication of integrated circuits and in photovoltaics. The wafer serves as the substrate for microelectronic devices built in and over the wafer and undergoes many microfabrication process steps such as doping or ion implantation, etching, deposition of various materials, and photolithographic patterning. Finally the individual microcircuits are separated (dicing) and packaged.
Do you sell platinised silicon wafers?
Yes! We sell Platinised and thin films of almost all the metals! Just let us know the specs and quantity for an immediate quote!
Do you sell one silicon wafer? If so, how?
Yes! We sell as few as one Silicon wafer. We sell in individual wafer carrier.
How do you clean Si 100 wafer before silicon dioxide is formed for bump production?
The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in semiconductor manufacturing.
Werner Kern developed the basic procedure in 1965 while working for RCA, the Radio Corporation of America.[1][2][3] It involves the following chemical processes performed in sequence: Removal of the organic contaminants (organic clean + particle clean) Removal of thin oxide layer (oxide strip, optional) Removal of ionic contamination (ionic clean)
Can you resize silicon wafers from 200mm to 100mm?
Yes! We can laser down the wafer so you could get two 100mm from one 200mm wafers including flats!
What is silicon wafer reclaim?
It's when you have a wafer that has thin films or oxide etc on them and we strip and clean them so the wafers can be reused. Often companies that want to save money or protect their intellectual property will reclaim their wafers.
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- Super Thin Silicon used for Solar Application with >45% effiencies
- Thick Silicon wafers used as substrates for depositing various films on them, like polymer membranes.
- Intrinsic Silicon wafers that let circuits built on it act very fast. This is also why one uses SOI wafers.
- Low resisivity Silicon wafers used by laboratories that use Epi growth reactors.
- Standard substrates used for npn transistor circuits
and optical applications. - Inexpensive Silicon wafers used to make ultra-pure and ultra-clean carrier that do not react with the organic sample to be analyzed.