Annealed Silicon Wafer All Specifications

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What are Annealed Silicon Wafer

Silicon Wafer Annealing uses a high-temperature furnace to relieves stress in silicon. The heat activates ion-implanted dopants, reduces structural defects and stress, and reduces interface charge at the silicon-silicon dioxide interface.

Silicon wafer annealing is used for the following purposes:

  • Relieve stress in silicon wafers
  • Activate or move dopants
  • Densify deposited or grown films
  • Repair implant damage in wafer processing
  • Change film to film or film to substrate interfaces for wafers with multiple films
  • Silicon on Insulator
  • Bonded wafers

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