LPCVD nitride films deposited on silicon be used to deposit silicon oxynnitride films at pressures of 5-100 Torr at an average temperature of 2,732°F. The same problem arises when using the prior art precursors mentioned above to produce a silicon oxide film with a thickness ratio of 0.3 - 1 mm or a width of less than 1.5 mm.
Below is just a small example of the Stoichiometric Nitride that we have in stock. Please let us know if you need another spec.
We also have the following SiN Wafers
We have a large selection of nitride coated silicon wafers.
Question
Our lab is planning to fabricate some silicon nitride waveguide. so we need to buy some silicon nitride wafers, which means we need around 150 nm stoichiometric silicon nitride films on thermal oxides silicon wafers. the thermal oxide layer should be at least 1 um thickness. silicon substrate is flexible. #1385 is good thermal oxide wafer for us. Do you have the processing service to grow 150 nm LPCVD low stress silicon nitride on #1385? can you please send me a quote? Thanks.
Answer
100mm P/B <100> 1-10 ohm-cm 500um SSP Prime Grade with 1um of Oxide and 150 nm LPCVD low stress silicon
Exw price $97.90 each for 25pcs
ID | Diam | Type | Dopant | Orien | Res (Ohm-cm) | Thick (um) | Polish | Grade | Description |
3307 | 50.8mm | P | B | <100> | 0.001-0.005 | 270um | SSP | Prime | w/ 100nm Stoichiometric LPCVD Nitride |
3445 | 50.8mm | P | B | <100> | 0-100 | 500um | DSP | Prime | w/ 620nm LPCVD Nitride |
3446 | 76.2mm | Any | Any | <111> | Any | 250um | DSP | Test | w/ 200nm Low Stress Nitride |
3480 | 76.2mm | ANY | ANY | <100> | Any | 250um | DSP | Test | w/ 200nm Low Stress Nitride |
1911 | 100mm | P | B | <100> | 1--10 | 500um | SSP | Prime | w/ 100nm of Standard LPCVD Nitride |
1913 | 100mm | P | B | <100> | 1--10 | 500um | SSP | Prime | with 300nm of Standard LPCVD Nitride |
1922 | 100mm | P | B | <100> | 0.001-0.005 | 500um | SSP | Prime | with 100nm Super Low Stress LPCVD Nitride |
2898 | 100mm | N | P | <100> | 1--10 | 500um | DSP | Prime | with 100nm Low-Stress LPCVD Nitride |
3455 | 100mm | P | B | <100> | 1--10 | 500 | SSP | Prime | with 500nm Low Stress LPCVD Nitride |