Quick Select Guide
- Silicon: Mechanical strength, CMOS compatibility.
- SOI: Precise etch stops, electrical isolation.
- Glass & Quartz: Transparency, low RF loss.
- Sapphire: High temp & chemical stability.
- SiC & GaN: Harsh environments, power MEMS.
Performance Insight:
Capacitive MEMS sensors using engineered substrates have demonstrated operation up to 500°C with extremely low temperature drift.
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Why Substrate Choice Defines MEMS Performance
In MEMS design, the substrate provides the mechanical support, thermal stability, and electrical isolation necessary for the device. As MEMS move into high-temperature and RF domains, bulk silicon is often supplemented by advanced materials.
Silicon Wafers: The Foundation
Bulk silicon remains the dominant MEMS substrate due to its excellent mechanical properties and well-understood micromachining behavior.
- Applications: Pressure sensors, accelerometers, micro-mirrors.
- Key Feature: Compatible with standard CMOS processing.
SOI and SIMOX: Superior Isolation
Silicon-on-Insulator (SOI) wafers introduce a thin device layer separated from the handle wafer by a buried oxide (BOX). This structure is crucial for defining precise device thickness and preventing leakage currents.
This structure is ideal for resonators and comb-drive actuators where precise etch stops are required.
Glass and Quartz: Optics & RF
When transparency or low dielectric loss is required, Glass substrates (like Borofloat 33) and Quartz are the materials of choice.
- Micro-fluidics: Transparent windows allow for optical inspection.
- RF MEMS: Low dielectric loss improves signal integrity in switches and antennas.
Compound and Wide-Bandgap Substrates
For harsh environments, Silicon Carbide (SiC) and Sapphire offer extreme durability.
- SiC: Supports high-temperature and high-voltage MEMS.
- GaAs/InP: Used for RF MEMS switches and photonic devices utilizing Gallium Arsenide or Indium Phosphide.
Substrate Services
UniversityWafer, Inc. also provides downstream services to enable MEMS fabrication, including:
- Wafer Bonding: Anodic and fusion bonding for capping.
- Thin Films: Deposition of Thermal Oxides and Nitrides.
- Dicing: Precision cutting of complex MEMS die.