Silicon nitride wafers combine high-quality silicon substrates with durable SiN (Si3N4) thin films to provide excellent electrical insulation, chemical resistance, and mechanical stability. UniversityWafer supplies LPCVD and PECVD silicon nitride-coated wafers for MEMS, photonics, microelectronics, semiconductor fabrication, and university research. Custom film thicknesses, stress levels, wafer diameters, crystal orientations, and substrate specifications are available to support both prototype development and production applications.
UniversityWafer supplies high-quality silicon nitride wafers with LPCVD and PECVD silicon nitride (SiN/Si3N4) coatings for universities, research laboratories, and semiconductor manufacturers. Our silicon nitride-coated substrates are used in MEMS fabrication, photonics, dielectric layers, passivation, masking, sensors, and advanced semiconductor processing.
Choose from custom wafer diameters, crystal orientations, coating thicknesses, stress levels, conductivity types, resistivity ranges, and surface finishes to match your fabrication process.
Recent Research Inquiry
"We are fabricating MEMS pressure sensors and require double-side polished silicon wafers with a low-stress LPCVD silicon nitride coating for use as an electrical insulation and etch mask layer. Can you provide custom film thicknesses and research quantities?"
Need a custom silicon nitride wafer? Complete the quote form with your required wafer diameter, substrate type, crystal orientation, silicon nitride thickness, deposition method (LPCVD or PECVD), surface finish, and quantity. Our technical team will recommend the best solution for your application.
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Silicon nitride wafers are silicon substrates coated with a thin film of silicon nitride (SiN or Si3N4), a dielectric material widely used in semiconductor manufacturing. Silicon nitride provides excellent electrical insulation, chemical resistance, mechanical strength, and moisture protection, making it an essential material for MEMS, microelectronics, photonics, sensors, and integrated circuit fabrication.
UniversityWafer supplies silicon nitride-coated silicon wafers with LPCVD and PECVD deposition processes. Researchers can specify wafer diameter, crystal orientation, conductivity type, resistivity, nitride thickness, stress level, and surface finish to meet the requirements of their fabrication process.
The two most common deposition techniques each provide unique advantages depending on the application. LPCVD films generally offer superior density and lower defect levels, while PECVD films are deposited at lower temperatures and are compatible with temperature-sensitive devices.
| Process | Typical Advantages |
|---|---|
| LPCVD Silicon Nitride | High-density films, excellent dielectric properties, superior chemical resistance, and ideal for MEMS and high-temperature semiconductor processing. |
| PECVD Silicon Nitride | Lower deposition temperatures, adjustable film stress, excellent surface passivation, and compatibility with CMOS fabrication. |
| Application | Purpose |
|---|---|
| MEMS Devices | Mechanical support layers, membranes, and electrical insulation. |
| Photonics | Optical waveguides, integrated photonic circuits, and optical sensors. |
| Semiconductor Fabrication | Diffusion barriers, dielectric films, and masking layers during processing. |
| Passivation Layers | Protect semiconductor surfaces from moisture, contamination, and ionic diffusion. |
| Microelectronics | Electrical isolation between conductive layers in integrated circuits. |
| Pressure & Chemical Sensors | Durable dielectric coatings with excellent chemical stability. |
| Power Devices | Surface protection and insulation for high-voltage semiconductor components. |
UniversityWafer offers custom silicon nitride-coated wafers with specifications tailored to research and production requirements.
For more than 25 years, UniversityWafer has supplied silicon nitride-coated wafers to universities, national laboratories, and semiconductor companies worldwide. Whether you need prototype quantities or production-scale materials, we provide custom silicon nitride wafers with flexible specifications, fast quotations, and knowledgeable technical support for research and manufacturing.