GaN Substrate vs Silicon

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What is the difference between Gallium Nitride Substrate vs Silicon?

This comparison outlines the key differences in material properties, device performance, and applications of Gallium Nitride and Silicon substrates.

Material Properties

Property Gallium Nitride (GaN) Silicon (Si)
Bandgap 3.4 eV (wide bandgap) 1.1 eV
Breakdown Field ~3 MV/cm ~0.3 MV/cm
Thermal Conductivity ~130 W/m·K ~150 W/m·K
Electron Mobility ~1,000 cm²/V·s ~1,400 cm²/V·s
Saturation Electron Velocity ~2.5×10⁷ cm/s ~1×10⁷ cm/s
Substrate Cost High Low
Maturity Newer, complex Mature, well-established

Performance & Device-Level Differences

Feature GaN Substrate Silicon Substrate
Power Density Much higher Lower
Switching Speed Faster Slower
Efficiency More efficient Less efficient
Frequency Range Excellent for RF and high-frequency Good for low/mid-frequency
Heat Resistance Excellent Moderate
Device Size Can be smaller Typically larger
Leakage Current Lower Higher

Application Areas

Area GaN Substrate Silicon Substrate
Power Electronics EVs, chargers, inverters Traditional power ICs
RF/Microwave Radar, 5G, satellite Low-power RF
Optoelectronics Blue/UV LEDs, laser diodes Infrared photonics
Consumer Electronics Fast chargers, audio amps CPUs, general ICs

Summary Table

Factor Gallium Nitride (GaN) Silicon (Si)
Performance Superior for high-power, high-frequency Adequate for general use
Cost High Low
Maturity Emerging Established
Best Use High-efficiency, compact devices High-volume, low-cost chips