GaN Wafers for Research and Production 

Gallium Nitride (GaN) wafers are enabling the next generation of high-frequency RF electronics, power semiconductor devices, LEDs, laser diodes, and 5G communications systems. UniversityWafer supplies research-grade and production-quality GaN on sapphire wafers, including p-type and Mg-doped GaN substrates for semiconductor, photonics, and optoelectronic applications.

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P-Type GaN on Sapphire Wafers for Research and Device Development

UniversityWafer supplies high-quality p-type Gallium Nitride (GaN) on sapphire wafers for semiconductor research, optoelectronics, LED fabrication, laser diodes, photonics, and advanced electronic device development. Our GaN substrates are available in multiple diameters, thicknesses, and doping configurations to support both prototype and production requirements.

A recent Ph.D. researcher requested custom Mg-doped p-type GaN on sapphire wafers with a thinner epitaxial layer than is commonly available from standard suppliers.

Research Request:

Custom p-type GaN on sapphire wafers with approximately 1 µm p-GaN thickness for semiconductor research applications. The researcher required Mg-doped C-plane p-type GaN and flexible wafer diameters ranging from 2-inch to 4-inch substrates for device fabrication and testing.

Custom GaN layer thicknesses, doping concentrations, and substrate configurations are often required for specialized semiconductor, photonics, RF, and optoelectronic applications. If your project requires unique specifications, our team can help identify the optimal wafer solution.

P-Type GaN Inventory Available.
Please reference #271480 when requesting pricing or technical information.

Send us your specifications and quantity requirements or purchase GaN wafers online .

Request a Fast Quote for P-Type GaN on Sapphire Wafers





P-Type GaN-on-Sapphire Wafer Inventory

Contact us for current availability, lead times, and volume pricing.

  • 2" (0001) Sapphire, 430 µm SSP, P-GaN 0.5 µm / UID 2.0 µm, Mg-doped P-Type
  • 2" (0001) Sapphire, 430 µm SSP, P-GaN 0.5 µm / UID 2.0 µm, Mg-doped P-Type

Additional GaN-on-sapphire wafer configurations, custom epitaxial structures, and specialized research substrates may be available upon request.

Gallium Nitride (GaN) Wafer Applications

Gallium Nitride (GaN) wafers are widely used in RF electronics, power semiconductor devices, LEDs, laser diodes, satellite communications, radar systems, and 5G infrastructure. Thanks to their wide bandgap, high electron mobility, and superior thermal performance, GaN substrates enable higher power density and greater efficiency than conventional silicon-based devices.

Gallium Nitride GaN Wafer Applications

GaN Applications in Advanced Semiconductor Devices

GaN Wafers for RF and 5G Communications

GaN technology has become a key material for RF power amplifiers used in wireless communications, radar systems, and next-generation 5G networks. Compared to traditional silicon devices, GaN transistors operate at higher frequencies and deliver greater power output while maintaining excellent efficiency.

GaN-based High Electron Mobility Transistors (HEMTs) are commonly used in cellular base stations, satellite communications, aerospace electronics, and defense systems where high-frequency performance is essential.

Power Electronics and High-Voltage Devices

GaN wafers are increasingly used to manufacture high-efficiency power devices including power transistors, switching devices, and advanced power conversion systems. The wide bandgap properties of gallium nitride allow devices to operate at higher voltages, higher temperatures, and faster switching speeds than silicon.

Applications include electric vehicles (EVs), renewable energy systems, data centers, industrial motor drives, consumer electronics, and fast-charging power supplies.

P-Type GaN on Sapphire Substrates

P-type GaN on sapphire wafers are widely used in LED fabrication, optoelectronics, laser diodes, photonics research, and advanced semiconductor device development. Magnesium (Mg) doping is commonly used to create p-type conductivity in GaN films for applications requiring efficient carrier transport and light emission.

Researchers frequently require custom GaN layer thicknesses, doping levels, and substrate diameters to support specialized semiconductor and photonics projects.

Advantages of Gallium Nitride Compared to Silicon

Gallium nitride offers several important advantages over conventional silicon wafers:

  • Higher breakdown voltage
  • Higher electron mobility
  • Lower switching losses
  • Higher power density
  • Improved thermal performance
  • Greater energy efficiency
  • Smaller device footprint
  • Higher frequency operation

These advantages allow engineers to design smaller, lighter, and more efficient electronic systems while reducing overall power consumption.

GaN Research and Future Applications

Research into gallium nitride continues to expand as manufacturers develop more cost-effective fabrication techniques and larger substrate sizes. Emerging applications include artificial intelligence hardware, machine learning accelerators, wireless power transfer systems, autonomous vehicles, quantum technologies, and next-generation communication networks.

As demand for high-performance semiconductor materials grows, GaN wafers are expected to play an increasingly important role in power electronics, RF communications, optoelectronics, and advanced research applications.

Related GaN, RF & Semiconductor Resources