Thermal Oxide Dry and Wet

Wet and Dry Thermal Oxide SiO2 Wafers in Stock

Thermal oxide, also called silicon dioxide (SiO2), is an insulating layer commonly used in semiconductor processing. UniversityWafer supplies wet and dry thermal oxide wafers from 25.4mm to 300mm, with oxide thicknesses from 200Å to 15µm.

Wet Oxide Specs

Wet thermal oxidation is commonly used for thicker oxide layers. It is usually grown on both sides of the wafer and is a cost-effective option for applications that need thicker SiO2 films.

• Thickness range: 500Å – 15µm
• Thickness tolerance: Target +/-5%
• Within wafer uniformity: +/-3% or better
• Wafer size: 50mm, 100mm, 125mm, 150mm, 200mm
• Wafer material: Silicon, SOI, Quartz
• Gases: Steam

Dry Oxide Specs

Dry thermal oxide is used for thinner, high-quality oxide layers and can be grown on one side of the wafer depending on the application requirements.

• Thickness range: 100Å – 2000Å
• Thickness tolerance: 100Å +/-15Å, 200Å +/-20Å, >200Å +/-5%
• Within wafer uniformity: +/-3% or better
• Wafer size: 50mm, 100mm, 125mm, 150mm, 200mm
• Wafer material: Silicon, SOI
• Gases: Oxygen