Metal Deposition on Silicon Wafer for University Students

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Metals Deposited:

• Aluminum (Al)
• Aluminum/Copper (AlCu) – .5, 1, 4
• Aluminum/Silicon (AlSi) – .1, 1, 2
• Aluminum Nitride (reactive)
• Carbon (C)
• Chromium (Cr)
• Chromium Oxide (Cr2O3) – Non-Reactive
• Chromium Silicon (CrSi)
• Cobalt (Co)
• Copper (Cu)
• Copper Nickel (CuNi) – 60/40
• Germanium (Ge)
• Gold (Au)
• Indium Tin Oxide (ITO)
• Iron (Fe)
• Molybdenum (Mo)
• Nickel (Ni)
• Niobium (Nb)
• Palladium (Pd)
• Platinum (Pt)
• Silicon – doped & undoped
• Silicon Carbide (SiC)
• Silver (Ag)
• Tantalum (Ta)
• Tin (Sn)
• Titanium (Ti)
• Titanium Nitride (TiN) – Reactive
• Tungsten (W)
• Zirconium (Zr)
• Zirconium Oxide (ZrO2)

 

Metal Deposition

UniversityWafer, Inc. and our partners provide metal films depostion services on silicon and other substrates.
With over 20 years of metal deposition service, we can meet your demand for small and large orders quickly.
Metallization is used in microcip fabrication. A metal film is deposited over a substrate's dielectric film.