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Our Standard nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.
Retains all of the same benefits associated with our standard nitride but can also be used for Membranes, Cantilever Beams and other mechanical structures associated with MEMS devices.
Has been developed for applications that require extremely low film stress. Film Stress can also be customized to meet your unique specifications.
Silicon Nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance. Silicon Nitride is produced in three main types; Reaction Bonded Silicon Nitride (RBSN), Hot Pressed Silicon Nitride (HPSN) and Sintered Silicon Nitride (SSN). We have Silicon Nitride 2" - 12" all specs and quanities.
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Below are just some of the Silicon Nitride Coated Wafers that we have in stock!
|ID||Diam||Type||Dopant||Orien||Res (Ohm-cm)||Thick (um)||Polish||Grade||Qty||1 Unit||5 Unit||10 Unit||25 Unit||Description|
|1912||100mm||P||B||<100>||0.001-0.005||500um||SSP||Prime||13||$90.90||$64.90||$54.90||$39.90||with 100nm of Standard LPCVD Nitride|
|1913||100mm||P||B||<100>||1-10||500um||SSP||Prime||14||$69.90||$64.90||$54.90||$39.90||with 300nm of Standard LPCVD Nitride|
|1917||100mm||P||B||<100>||1-10||500um||SSP||Prime||10||$103.90||$76.90||$55.90||with 100nm of Low Stress LPCVD Nitride|
|1922||100mm||P||B||<100>||0.001-0.005||500um||SSP||Prime||1||$120.90||$88.90||$64.90||with 100nm Super Low Stress LPCVD Nitride|
|3028||100mm||P||B||<100>||1-10||525um||SSP||Prime||23||$105.48||$81.48||$69.48||$59.88||WITH 2 Layers: 500nm Wet Thermal Oxide, and, 40nm Nitride|