Our stoichiometric LPCVD nitride can be a very effective insulator and works great as a KOH etch mask when deposited over thermal oxide.
This versatile film can be used for building MEMS devices or as a tool for defining active regions during field oxidation.
As with all of our films, we have worked hard to develop a stable and consistent stoichiometric LPCVD nitride process that can be used for many applications.
With our fast lead-time you can feel confident using our stoichiometric LPCVD nitride throughout your device fabrication process.
We encourage you to take advantage of our process reservation options, and pre-schedule your nitride runs before your wafers arrives at our facility.
Low stress LPCVD nitride is one of our most popular films and is often used for building membranes, cantilever beams, and other mechanical structures. Low stress nitride is also very effective as a KOH mask and can be deposited up to 2µm in thickness.
Our engineers have over 15 years experience in developing and optimizing LPCVD nitride films. Our low stress LPCVD nitride process is a mature stable process that you can count on. We believe that our ability to provide you with consistent, high quality, low stress nitride will help to enhance repeatability throughout your manufacturing process.
Our super low stress LPCVD nitride has all of the same benefits of our low stress LPCVD nitride and can be deposited up to even greater thickness. We have developed our super low stress LPCVD nitride for applications that require a film that has extremely low stress. This specially engineered super low stress LPCVD nitride can be deposited up to 4µm in thickness without cracking or peeling.
Super low stress LPCVD nitride adds flexibility to many device fabrication processes and is now commercially available in greater thicknesses than ever before! Call now to discuss your unique needs with our highly knowledgeable staff.
Our LPCVD nitride process uses very specific gas ratios to produce the film properties that are most sought after. Because of the unique stability of our nitride process we are able to offer you the opportunity to customize film stress to fit your exact application.
We have a highly experienced team of engineers and technical staff that can work with you to define which film stress will yield the best results for your application. Once your unique process is developed, you can feel confident that whenever you place a repeat order we will refer to our detailed process records to insure you are receiving the film you expect.