We have Wet and Dry oxide from a few ansgrstoms thick up to 20 micron thick.
We can deposit Nitride, or metals onto the oxide layer in small quantities and large.
Researchers have used the followng test grade silicon to float films and tranfer to another substrate.
Below you'll find some of the Thermal Oxide Coated Silicon Wafers in stock at our online store. Buy online and save!
All diamaters from 25.4mm, 50.8mm, 76.2mm, 100mm, 125mm, 150mm, 200mm and 300mm.
Thickness range: 500Å – 15µm
Thickness tolerance: Target +/-5%
Within wafer uniformity: +/-3% or better
Wafer to wafer uniformity: >+/-5% or better
Sides processed: Both
Refractive index: 1.456
Film stress: -320MPa (Compressive)
Wafer size: 50mm, 100mm, 125mm, 150mm, 200mm
Wafer thickness: 100µm – 2,000µm
Wafer material: Silicon, Silicon on Insulator, Quartz
Temperature: 950C° – 1050C°
Equipment: Horizontal Furnace
Our Ultra-Pure Wet Thermal Oxidation process is designed to insure that you receive the highest quality films. Prior to thermal oxidation
all wafers will receive a pre-furnace clean.
Our ultra-pure Dry Oxidation process is available for those applications requireing thinner oxides, and is designed to ensure that you
receive the highest quality film.