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In this article we are going to discuss the latest developments in silicon on insulator (SOI) technology and the benefits of integrating such material into modern chip manufacturing processes. Before delving into the benefits of integrating silicon on insulator (SOI) material with modern chip making techniques, let's first define the material. Soi is a special type of material that is made from pure silicon or other element that has high electrical characteristic. The material's electrical conductivity and thermal conductivity are extremely low - making it ideal for use in electronics. Its other properties, such as its anti-reflection, anti-corrosion, and non-marking, make it a preferred choice for components in high-tech electronics and optoelectronic applications.
With advances in computer chip manufacturing and design capabilities, SOI technology is quickly turning up in numerous industrial, medical, and other applications. One of the hottest places for using silicon on insulator (SOI) in the fabrication process is in computer chip making and design. The potential applications of this material are virtually endless. Following is a brief description of the benefits of SOI for high-volume manufacturing processes and devices, and an examination of silicon photonics integrated devices manufactured using this material.
The primary benefit of using silicon on insulator (SOI) for high-volume chip manufacturing is the increased production rate associated with reduced cycle times. With a substrate, the silicon is deposited on the substrate directly with no need to insert any sort of additional material. When compared to traditional methods of chip fabrication where chip-making materials have to be added to the dies after fabrication starts, using soi reduces time and costs. The substrate can be immediately used by the computer-chip making process. It also enables quick prototyping and rapid product development.
The second benefit of using SiO2 for substrate layering is increased functionality and reliability. As the substrate layering process progresses, material can be added to the device or die while the chip is being made. This adds variety to products, increases product reliability, and enables new markets to be opened. Because SiO2 is a high-molecular weight material, it is widely used as a liner in medical applications. Its ability to resist high temperatures makes it a good choice for everything from soft implants to dental implants.
SiO2 has several key advantages over traditional dielectric isolation processes. The most important advantage of SiO2 is that it provides higher energy dissipation than most other dielectric additives. In addition, SiO2 offers higher temperature stability than most VMTs, making it a superior dielectric. Some of the reasons for this superior thermal stability include high-solvation design, a design feature that allow low-probability bonding of SiO2 with glass, and high-number production methods including bulk silicon on insulator wafer bonding. These advantages have resulted in the use of SiO2 in wide-ranging process applications including precision coating, metal adhesion, flexible roll laminates, mechanical seals, brazing, and carbon adhesives.
The benefits of this high-performance substrate are particularly apparent in the area of small device fabrication. Typically found in aerospace and defense applications, the use of SiO2 for wafer bonding and the use of small channel width dielectric interfaces have enabled the development of SiO2/SID dielectric devices for a broad range of applications, including space flight and electronic inspection. Simox also provides a unique process control for fabricating semiconductor devices, which enables small-volume production and provides the optimization of manufacturing parameters.
The SiO2/SID wafer bond using SiO2 gas or silicon on insulator is produced by dielectric heating. The heat generated during dielectric heating causes the hydrogen to be separated from the silicon, which in turn creates a solid binder layer. The presence of a binder layer provides a higher tolerance to wear and makes the device flexible and resistant to chipping. By varying the heat of dielectric heating at various stages of production, SiO2 can also be applied to produce an oxide layer which provides additional resistance to wear. This oxide layer is also helpful in lowering the cost per unit of device with mixed oxide and SiO2, although this is of little benefit if thermal variation is part of the process.
Another key advantage to the use of SiO2 in soi wafers lies in the ability to easily insert the device into an existing production line without the need for redesigning the entire production line. Through the use of a smart cut, a thin, custom-made silicone implant is placed into the empty top layer of a SiO2 wafer, which then seals tightly. Once this is done, a high-quality silicone dielectric layer is self-adhering to the newly-sealed area. Because of its unique ability to self-align with the electric field, the layer provides excellent electrical conductivity and temperature range as well as ensuring minimal transfer of solid material to the next layer.