Stoichiometric LPCVD Nitride for University Researchers
Get Your Quote FAST!
Stoichiometric LPCVD Nitride
Stoichiometric LPCVD nitride has good high temperature strength, creep resistance and oxidation resistance. Silicon Nitride's low thermal expansion coefficient gives good thermal shock resistance. Silicon Nitride is produced in three main types; Reaction Bonded Silicon Nitride (RBSN), Hot Pressed Silicon Nitride (HPSN) and Sintered Silicon Nitride (SSN). We have Silicon Nitride 2" - 12" all specs and quanities.
Our Standard nitride film works great as hard mask for KOH etching and can be used as a tool for defining active regions during field oxidation.