Single Crystal Sapphire (Al2O3) Wafers

university wafer substrates

Get Your Quote FAST!




What are Single Crystal Sapphire (Al2O3) Wafers?

Single crystal sapphire is a transparent, crystalline material made of pure aluminum oxide (Al2O3). It is a tough and hard material with a Mohs hardness of 9, making it one of the hardest known materials. It is also chemically resistant and has a high melting point, making it ideal for use in a variety of applications.

Single crystal sapphire is commonly used in the electronics industry as a substrate for the growth of semiconductor materials such as gallium nitride (GaN). It is also used in the production of high-strength and wear-resistant parts, including bearings, seals, and ball valves. In addition, single crystal sapphire is used in a variety of optical applications, including as a window material in high-pressure cells, as a lens in lasers and telescopes, and as a protective cover for LCD displays.

The decomposition temperature of single crystal sapphire is around 2100°C. This high temperature makes it resistant to decomposition under most conditions, but it can still be affected by impurities or defects in the material.

Different Types of Silicon Crystal Sapphire Applications

Using silicon crystal sapphire in electronics has become a popular way to increase the efficiency of a device. It's also a very cost-effective way to create these devices, which is especially useful in the semiconductor industry. But there are many different kinds of sapphire, which makes it difficult to choose the best type for a specific application.

sapphire market 2020-2030

Synthetic sapphire

Synthetic sapphire is a hard, crystalline mineral that is commonly used in electronics applications. This material has excellent electrical and thermal properties, and has a unique geometric crystalline structure. These qualities make it ideal for applications in aggressive environments.

In addition to electronics, synthetic sapphire is also used for shatter-resistant windows in armored vehicles. It is also an alternative to fused silica for optical applications.

Synthetic sapphire has a high electrical insulating properties, which makes it a good substrate for single crystal semiconductors. It also has a low density of porosity, which helps to minimize thermal conductivity. During its growth, synthetic sapphire forms a hexagonal or rhombic crystal.

Synthetic sapphire is produced by cooling a raw material in a controlled manner. The raw material is then melted to form a crystalline solid. Once the crystal is formed, the material can be cut into gemstones and crystal slices.

Sapphire is a refractory material that is resistant to many chemicals. Because of its resistance, it is used in lenses and prisms. Also, it is highly durable and can withstand high temperatures.

Sapphire can be used to produce prisms, refractors, and lenses. In addition, it is a glare-free and scratch-resistant material. Aside from optical applications, it can also be used in high-radiation systems.

Using sapphire in electronics applications is not difficult, though it is important to choose the right crystal orientation for etching. This will determine how well the etching process performs.

Another reason to use sapphire in electronics applications is its ability to provide wide-band transparency. Sapphire is a good insulator, and its high purity makes it an ideal choice for electronic applications.

As the demand for scratch-free screens grows, smartphone manufacturers may be interested in using sapphire technology. However, the capacity to manufacture sapphire is not enough to meet demand.


Silicon-on-Sapphire (SOS) applications are found in a wide range of devices and applications, including displays, sensors, membranes, pressure transmitters, and photonic crystal structures. These devices have many advantages over conventional non-SOS-bonded silicon sensors. However, early challenges to commercial manufacturing exist.

One major challenge is the formation of small transistors. The process uses an epitaxial growth of a thin silicon layer on a sapphire substrate. This causes the introduction of a thick defect region and lattice mismatch. In turn, this leads to mechanical damage and dislocations in the substrate.

Another challenge is the asymmetry of the substrate-deposit orientation. It can cause instability and affect the heteroepitaxial silicon. Computer simulations can resolve this issue.

Finally, radiation induced acceptor states can be a concern. Such states can affect NMOS and PMOS transistors. For example, they can lead to higher I-V characteristics. So, scientists are investigating ways to improve dielectric resonators to increase their power capacity.

To avoid the problem of asymmetric growth, a dual-rate growth technique has been developed. This technique uses high growth rates to cover the surface of the sapphire substrate quickly. Alternatively, a low temperature ion implant can be used to form the high-quality silicon film.

The advantages of an insulating substrate are well-known. For example, it can reduce parasitic capacitance. It can also prevent stray currents from spreading. Furthermore, it provides better linearity and speed.

Nevertheless, epitaxial silicon growth on a sapphire wafer faces lattice mismatch and discordant thermal expansion coefficients. Therefore, the defect density is higher than in a pure silicon substrate. This results in lower hole mobility. A low election mobilities can lead to poor performance compared to bulk silicon.

RF switches

Switches used in RF applications have many performance criteria to consider. These include insertion loss, power handling, frequency range, isolation, linearity, packaging and reliability. A switch may consist of a single transistor or one or more stacked series circuits.

Semiconductor switches are commonly used in RF applications. However, they are often subject to high insertion loss at higher frequencies. They are also susceptible to nonlinear phenomena. CMOS silicon-on-insulator (SOI) technology can overcome these issues, offering a variety of desirable characteristics.

SOI technologies are applied in applications that require high speed operation and radiation hardness. Typical features of these devices include bonded wafers, silicon-on-sapphire, and e-beam metal evaporation. The advantages of these materials are their low breakdown voltage, low resistance and a high density.

Silicon-on-sapphire CMOS FETs are manufactured on an insulating sapphire substrate. These devices have a very low Ron-Coff product and can be stacked in series to handle very high voltages.

Semiconductor RF switches are available in a wide range of performance specifications. They can be specified for frequencies from 1 GHz to 5 GHz. Depending on the application, these devices must be designed with maximum and minimum values. Generally, the device must operate within a 50 O power limit.

In addition, the device must have high isolation. This is important for systems operating at very high frequencies. For example, cable TV networks require a proper termination impedance. Other wireless technologies such as WiFi and cellular 4G/5G must operate in challenging environments.

RF switches based on PCM have been developed. Compared to semiconductor based devices, they have lower insertion loss and better isolation. However, they have fundamental limitations, such as area dependency and scaling to higher frequencies. Also, they have a relatively slow switching time due to heat transport.

Possible growth mechanisms for residual dislocations in sapphire

The growth mechanism of residual dislocations in sapphire (a-AI,O) under hydrostatic confining pressure has been studied. It has been observed that basal twinning occurs during the initial growth. However, the mechanisms involved in the introduction of these TDs are still unclear. Fortunately, simulations can provide a thorough insight into the mechanism. This paper presents some results of this study.

First, the density of threading dislocations is similar to that of pinholes. These results indicate that threading dislocations originate from the surface, while pinholes are believed to be formed by dislocations that terminate on the surface. In addition, there is a high density of pinholes in the GaN buffer layer. Moreover, the strain in the buffer layer is two times less than what is expected from pseudomorphic growth.

Next, the growth mechanism of these a-type TDs was investigated using scanning electron microscopy and X-ray diffraction. It was found that the top TD density was reduced by a factor of seven to one by hydrothermal treatment. There was also evidence for lateral overgrowth. Interestingly, lateral overgrowth can relax in-plane strain effectively.

Third, the growth mechanism of these a-type dislocations was investigated by examining the effect of a thin AlN template layer grown on sapphire. This AlN layer had a density of 8.6 x 108 cm-2. At 200 degC, it was deformed via dislocation slip. Although this technique showed the formation of a new dislocation, it did not result in crack propagation.

Fourth, the growth mechanism of these a-type residual dislocations was investigated by studying the behavior of the asymmetrical GaN/AlN SLs in the basal plane. This SL has a radius of curvature of 70 m.

Surface roughness of a single crystal of sapphire

Surface roughness of a single crystal of silicon crystal sapphire is known to be one of the most important factors affecting the performance of LEDs. However, there are still many problems regarding the processing of this material. Especially, there are some limitations related to the wet chemical cleaning process. In this study, we used an atomic force microscope (AFM) to view the microscopic surface of sapphire wafers. Afterwards, we conducted an experiment to analyze the surface roughness of the sapphire substrates.

The main objective of this experiment was to investigate the effect of flexible and rigid polishing plates on the surface roughness of sapphire wafers. Among them, the flexible polishing plate could reduce the surface roughness from 10 nm to 9 nm, whereas the rigid polishing plate reduced it to 2.5 nm.

In addition, the flexibility and rigidness of the polishing plates were analyzed by using finite element analysis. It is known that the removal ability of abrasive particles depends on the hardness and the elastic modulus of the matrix. Therefore, a balance between the hardness and removal ability of the abrasive particles should be studied. Compared with the rigid polishing plate, the flexible polishing plate could also decrease the surface/subsurface damage of sapphire wafers.

In addition to the flexibility and rigidity of the polishing plates, their processing characteristics were analyzed. They are mainly influenced by the hardness of the abrasive particle and the polishing plate. This is necessary to find an appropriate processing method for the improvement of the surface quality of sapphire wafers.

Another objective of this study was to identify the removal ability of the abrasive particle and determine the relationship between the abrasive particle and the hardness of the polishing plate. These results are crucial for the design and development of the processing equipment.