What Susbstate is Used for Spectroscopic Ellipsometry
A scientist at a solar company used our silicon wafers for their project.
What would be the cost and lead time for the above Item #S962 on a per wafer basis? I am just looking for a quick turnaround on a polished silicon substrate to use for spectroscopic ellipsometry. I have no particular electronic requirements. I prefer a 100 substrate.
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How Scientists Use Spectroscopic Ellipsometry
Spectroscopic ellipsometry is a powerful analytical technique used by scientists to measure the thickness and optical properties of thin films and surfaces. Here are some of the ways in which scientists use spectroscopic ellipsometry:
Characterizing the thickness and refractive index of thin films: Spectroscopic ellipsometry is an excellent technique for measuring the thickness and refractive index of thin films. By analyzing the changes in polarization and phase shift of light reflected from the surface of the film, scientists can determine its thickness and refractive index with high accuracy.
Determining the optical constants of materials: Spectroscopic ellipsometry can be used to determine the optical constants of materials, such as the refractive index and extinction coefficient. These constants can provide valuable information about the optical properties of a material, such as its transparency or absorbance.
Analyzing surface roughness: Spectroscopic ellipsometry can be used to analyze the surface roughness of a material. By measuring the changes in the polarization of light reflected from the surface of the material, scientists can determine the roughness and texture of the surface.
Monitoring thin film growth: Spectroscopic ellipsometry can be used to monitor the growth of thin films in real-time. By analyzing the changes in the ellipsometric parameters during the deposition process, scientists can determine the thickness and optical properties of the growing film.
Studying surface and interface chemistry: Spectroscopic ellipsometry can be used to study the chemistry of surfaces and interfaces. By analyzing the changes in the polarization of light reflected from the surface or interface, scientists can determine the chemical composition and structure of the material.
Overall, spectroscopic ellipsometry is a versatile technique that is widely used in materials science, nanotechnology, and semiconductor research. Its ability to provide accurate and non-destructive measurements of thin film properties makes it an indispensable tool for scientists and engineers.