Substrates for E-Beam Lithography

university wafer substrates

Substrates Used in E-Beam Lithography

Researchers have used the following substrates for their projects.

"I'm using these silicon wafers for nanostructure fabrication (magnetic nanowire, rings etc.) using E-beam lithography"

Phd Candiate.

Item 447: 3" P(100) 1-100 ohm-cm SSP 380um Test Grade

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2 Inch Silicon Wafers for E-Beam Lithography Membrane Fabrication

A posdoc requested a quote for the following:

We need to buy 2" Si with SiO2 layer wafers mostly suitable for e-beam lithography. For this purpose I think it is quite standard to use about 1-10 ohm-cm conductivity. We are unsure about the SiO2 thickness, we will have more discussion about everybodys needs (probably varying between 50-300nm).

Do you have a list of standard wafers that are available? Further, I would like to have some Si with SiN wafers that would be suitable for membrane fabrication, this means low stress SiN. The prefered thickness would be 30nm and the wafer thickness of 200um.

Reference #221285 for specs and pricing.

Which Substrates are Suitable for E-Beam Lithography?

Electron-beam lithography (EBL) is a type of lithography used to create patterns on a substrate using a focused beam of electrons. The choice of substrate for EBL depends on several factors, including the type of electron beam resist being used, the resolution requirements, and the desired properties of the final pattern. Generally, substrates that are suitable for EBL have a smooth surface and can withstand the vacuum environment required for the process. Some commonly used substrates for EBL include:

  1. Silicon: Silicon wafers are commonly used in EBL because of their smooth surface, high purity, and compatibility with a wide range of electron beam resists.

  2. Glass: Glass substrates are also frequently used in EBL due to their smooth surface, transparency, and chemical stability.

  3. Quartz: Quartz substrates are similar to glass substrates but have higher thermal stability and can withstand higher temperatures.

  4. GaAs: Gallium arsenide substrates are commonly used in EBL for high-resolution patterning applications due to their high electron beam sensitivity and low resistivity.

  5. Sapphire: Sapphire substrates are used in EBL for their high mechanical and chemical stability, making them suitable for high-temperature and harsh chemical environments.

Overall, the choice of substrate for EBL depends on the specific requirements of the application and the properties of the electron beam resist being used. Other substrates that may be suitable for EBL include metals, polymers, and ceramics, among others.