We have 100mm, 150mm and 200mm Silicon Germanium (SiGe) wafers. SiGe strained silicon provides an alternative substrate for CMOS manufacturing using silicon. SiGe wafers are suitable for mixed-signal circuits.SiGe is much less expensive than Gallium Arsenide (GaAs) heterojunction technologies.
Please let us know if you can use our SiGe specs or let us know if you have specs you would like us to quote.
Description Prime,Single crystal Silicon
Diameter 100mm, 150mm & 200mm
Thickness Semi Standard
Resistivity 1-100 Ohm.cm
Type P-type/N-type
Polish One side epi polished
Orientation (100)
Epitaxial layer
Composition SixGe1-x
Thickness Upon-requst
Dopant None
Stress state Strained/Relaxed
Researcher SiGe Question:
Do you supply Si0.1Ge0.9 films on Si Substrates? I am looking for a 2µm thick relaxed film. If yes: Do you know the threading dislocation density on top of the Silicon Germanium SiGe-Film? Is possible to do epitaxy on top of this surface?
Silicon Germanium Answer:
2um thick "Si0.1Ge0.9" film with Ge composition too high and too thick,it not do able.
2um thick Ge on Silicon wafer is ok to supply
Researcher Question:
What is the pricing on a 4" SiGe film, 50nm thick, on a Silicon Wafer? Would the price change if the SiGe film was 30nm or 20nm thick?, 50nm thick, on a Silicon Wafer? Would the price change if the SiGe film was 30nm or 20nm thick?
SiGe Film Answer:
Yes,the price will change a little while the SiGe film thickness changes,pls confirm the Ge composition and the order qty. per the item, after this,we shall give you a quote.
I was wondering is the composition of the thin film controllable? saying SiGe, Si3Ge1 and Si1Ge3.
I am interested in the product of SiGe on Si wafer. I was wondering is the composition of the thin film controllable? saying SiGe, Si3Ge1 and Si1Ge3. Can I get a quotation for the following wafers?
1 um thick SiGe film on Si wafer (4') *2
1 um thick Si3Ge1 film on Si wafer (4') *2
1 um thick Si1Ge3 film on Si wafer (4') *2
100 nm thick SiGe film on Si wafer (4') *2
100 nm thick Si3Ge1 film on Si wafer (4') *2
100 nm thick Si1Ge3 film on Si wafer (4') *2
If the composition is not controllable, please also send me a quotation for the following wafers.
10 um thick SiGe film on Si wafer *4
1 um thick SiGe film on Si wafer *4
100 nm thick SiGe film on Si wafer *4
SiGe Thin Film Answer:
The composition is controllable, just "Si1Ge3" the Ge composition is high,the SiGe layer thickness can not achieve 100nm,what about "Si2Ge2"?
Si1Ge3, SiGe and Si3Ge means the Si/Ge ratio in the thin film is 1:3, 1:1 and 3:1 respectively. What's the thinnest thickness you can make? Actually we only need 1-2 pieces for each film.
Researcher asks:
I wanted SiGe film on Silicon wafer, not Si-on-Ge-on-Silicon wafer. Different compositions means different concentrations of Ge in SiGe film. Please take a quick look at the paper attached in which they controlled the Ge concentration to 20, 40, 60 and 80%.Si3Ge: concentration of Ge in SiGe film is 25%
SiGe: concentration of Ge in SiGe film is 50%
SiGe3: concentration of Ge in SiGe film is 75%If 75% Ge is too high for your synthesis, 25 and 50% also work for us.
Hope this makes things clear., not Si-on-Ge-on-Silicon wafer. Different compositions means different concentrations of Ge in SiGe film. Please take a quick look at the paper attached in which they controlled the Ge concentration to 20, 40, 60 and 80%.
Si3Ge: concentration of Ge in SiGe film is 25%
SiGe: concentration of Ge in SiGe film is 50%
SiGe3: concentration of Ge in SiGe film is 75%If 75% Ge is too high for your synthesis, 25 and 50% also work for us.
Hope this makes things clear.
Answer:
We have the following specs. Please fill out the form for pricing.
Researcher Question:
Do you have the following SiGe spec?
Si+2at%Ge wafers
Wafer diameter : 40- 50 mm
Type: n-type
Orientation [100]
Resistivity: more than 1000 ohm.cm (noncompensated)
Dopant: Phosphorus
Thickness: 0.5 mm
Two-side polished.
Answer:
Yes, we have:
Si+2at%Ge wafers,Si0.98Ge0.02 wafer
Wafer diameter : 100 mm
Type: n-type
Orientation [100]
Resistivity: more than 1000 ohm.cm (noncompensated)
Dopant: Phosphorus
Thickness: 0.5 mm
Two-side polished.
Please ask for pricing.
Diamater: 100 mm, 150 mm
Resistivity: Boron heavily doped
Type: p-type
Composition: x=0.7, 0.6, 0.5
SiGe thickness: 100 nm or 200 nm
Dopant: Boron
Stress state: whatever
Answer Yes! We have the following:
Diameter 100+/-0.25mm
1# SiGe-on-Silicon Wafer,40% Ge Composition
Silicon Substrate
Description Prime,single crystal Silicon
Thickness 525+/-25um
Resistivity 1-10 Ohm.cm
Type P-type(Boron doped)
Polish One side epi polished
Orientation (100)
Si x Ge 1-x Epitaxial layer,x=0.6,1-x=0.4
Composition Si x Ge 1-x
Thickness 100nm
Dopant Boron
Stress state Relaxed
150mm SiGe/Silicon Wafer
2# SiGe-on-Silicon Wafer,40% Ge Composition
Silicon Substrate
Description Prime,single crystal Silicon
Diameter 150+/-0.25mm
Thickness 625/675+/-25um
Resistivity 1-10 Ohm.cm
Type P-type(Boron doped)
Polish One side epi polished
Orientation (100)
Si x Ge 1-x Epitaxial layer, x=0.6,1-x=0.4
Composition Si x Ge 1-x
Thickness 100nm
Dopant Boron
Stress state Relaxed
Researcher Question:
Do you have have SiGe with an epitaxial layer?
Answer:
Yes,We can supply Si/Ge 80/20 and 70/30 two different composition
4'' 100mm SiGe/Silicon Wafer
SiGe-on-Silicon Wafer,20% Ge Composition
Silicon Substrate
Description Prime,single crystal Silicon
Diameter 100+/-0.4mm
Thickness 500~550um
Resistivity 1-20 Ohm.cm
Type P-type(Boron doped)
Polish One side polished
Orientation (100)
Thermal Oxide layer 100nm
Si1-xGex Epitaxial layer,x=0.2,1-x=0.8
Composition Si1-xGex
Thickness 100nm
Dopant None
Stress state Relaxed
Researcher Question:
I'm looking for silicon germanium wafers n-type (100) with different Ge concentration.
Answer:
We can supply SiGe with different of Ge concentration:
Diameter 50.8mm, 100mm and 150mm
Type : n-type (100) Silicon germanium
Resistivity: less than 0.1 ohm.cm
One side polished
Please send us your specs!
SiGe Layers can be customized to meet your specific research needs or compare high temperature SiGe to silicon based devices or integrated circuits for performance differences.
Researchers have been using indirect bandgap semiconductor materials including cubic silicon (Si), germanium (Ge) and SiGe alloys to achieve efficient light emission from direct-bandgap hexagonal Ge and SiGe alloys.
Please send us your specs for a quote.
For decades researchers have worked hard to tfabricate SiGe based lasers that can seemlessly integrate into todays existing chips. This new technology has caught up to Indium Phosphide and Gallium Arsenide currently found in todays chip. The speeds of SiGe based devices could increase by 1000%.
We can provide Blue and Green color,the epi stack structure is "LED MQW epi structure / Silicon epitaxy / SiGe epitaxy / Silicon substrate " at least 3 mode of epi process. Price is dependent on quantity.
Pelase send us your specs!
We can provide SiGe wafer 4'',6'' and 8'',the price depends on the final requirements. Please send us your specs and quantity for an immediate quote.
Researchers from ETH have created a modulator that reduces signal loss during light to data transfer using Silicon Germanium transistors.
Source: IEF/Springer Nature Ltd.
Silicon germanium (SiGe) is an alloy epitaxial wafer, it's has a higher cost for semiconductor IC, etc. Gallium arsenide (GaAs) is a lower cost substrate for LED, LD applications, or related epitaxial growth.