Thin Film Electronic Devices on Silicon Dioxide

University Wafer Silicon Wafers and Semicondcutor Substrates Services
University Silicon Wafer for Production

Wafers Used to Deposit Thin Film Electronic Devices

Our clients use Dry Thermal Oxide for making thin-film electronic devices.


"We are making thin-film electronic devices on the surface of the silicon dioxide, and using the silicon and a electric field back-gate. With the wet thermal oxide, we find that the oxide leaks significantly, leading to an unusable device. Thus we need dry oxide."

The spec used for this:

100mm P(100) 0.001-0.005 ohm-cm SSP 500um with 300nm of Dry Oxide on Polished Side Only

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Thin-Film Electronic Devices Silicon Dioxide

Silicon dioxide (silica) is one of the most abundant substances in the world of semiconductor materials. Its ability to shape the surface of silicon is the main reason that has made it the largest and most widely used semiconductor material. The aim of this invention is therefore to produce a thin germanium film using a combination with silicon dioxide. [Sources: 3, 6, 10]

First, a 300-nanometer nickel (Ni) film is deposited on a silicon wafer (silicon dioxide (Si) or SiO2). Although silicon oxide (SiO2), typically used in integrated circuits, typically deposits as a polycrystalline layer on the silicon surface, which therefore often borders on silicon surfaces, germanium can be deposited in the same way. In this way, the polycrystal sinsilicon layer is exposed to a gas containing g germanium, while the germ has deposited as silicon carbon dioxide alone at more than 410Adeg (c), thereby preventing the formation of a thin film of less than 1 nanometer (0.5 mm) thickness. [Sources: 9, 10]

In particular, it is preferable to use an evenly covered SiO2 thin film of less than 1 nanometer (0.5 mm) to provide high protection against the effects of the g-germanium layer on the silicon surface. Although silicon dioxide films can be produced in various ways (e.g. by using a silicon wafer), the ALD process (silicon dioxide) disclosed here is the most common method for producing dielectric layers for field emission indicators. [Sources: 4]

The researchers believe the process can also be used on thin-film electronics, including printed circuits. If different component layers are sufficiently thin and a suitable flexible end-host substrate is selected, the transistors can be mechanically flexible thin-film transistors. [Sources: 2, 9]

Thin-film electronic devices can be manufactured on a component substrate that contains an active layer of a sacrificial layer carried by a single crystal semiconductor. Other preferred embodiments are silicon dioxide thin films consisting of a thin layer of silicon oxide such as silicon nitride or silicon oxide. However, this technique has the disadvantage that the catalyst remains in the produced silicon oxide thin film and produces a deteriorating contamination effect. Selective etching of the oxide film is required for the use of silicon dioxide in integrated circuits (IC) and the production of MEMS. [Sources: 2, 4, 8, 11]

The ultra-thin SiO2 film can be embedded in conventional deep submicron (ULSIC) where the gateoxide is reduced to less than 30A, a significant improvement over conventional Si-based devices such as semiconductors and MEMS. [Sources: 6]

The properties of thin films can be studied in various ways, for example by using coatings that can alter or improve the properties. Different techniques and different processing environments were investigated to deposit silicon dioxide films at any temperature down to room temperature. [Sources: 5, 8]

In the current method, thin-film electronics are manufactured on a component substrate containing an active layer of a semiconductor material with a single crystal supported by a sacrificial layer desirable strong enough to withstand the high temperature and pressure conditions of the silicon dioxide substrate. Meanwhile, there is no conventional way to form thin silicon oxide films at room temperature without the use of high, low and / or high pressure processing techniques. C aSS500Adeg, an SS500 Adeg (C.A.C.) and the same process in the presence of water. [Sources: 2, 11]

In order to produce semiconductor devices according to the present invention, an insulating layer is formed on the silicon dioxide substrate from a thin film of silicon oxide produced by the coating process. The processing temperature is between 0 ° C and 200 ° C, and the annealing effect simultaneously improves physical and electrical performance. In this conversion reaction, silicon oxides are obtained in thin layers from a casing of silicon compounds, including silicon structures and siloxane structure. This silicon - compound thinner film is converted into silicon oxide thin film. [Sources: 11]

Being able to characterize hydrogen and water in a much better way is important for the semiconductor applications of silicon dioxide. Due to its high thermal conductivity, aluminium oxide is an important material in the production of high-quality thin-film semiconductors. High-K materials are a key component of the nanometer - scaling thin silicon oxide layers and becoming a critical component that allows ultra-thin layer stacks with gate insulators to scale nanometer further - scaling devices. Silicon dioxide thin film silicon dioxide is preferred to other dielectric films due to its sio-insulator properties and is a good candidate for use as an insulating layer in nanoscale components such as nanotubes and nanostructures. [Sources: 1, 3, 8]

After detecting visible luminescence in porous silicon, the researchers began to produce nanocrystalline silicon from silicon - rich oxides. Since SiO (X) thin films can be produced using CMOS-compatible methods, the production of nanocrystallines of silicon in silicon thin films of silicon offers another advantage. Although the wafers are now protected by a silicon dioxide layer (Sio2), they are still capable of embossing circuits with densely packed electronic components. The polymer patterns exposed by the developed photoresist are etched into the silicon oxide layer of the thin film SiliconO2. [Sources: 0, 7, 12]