2 Inch Sapphire Wafers for Research and Production

university wafer substrates

Thin Double Side Polished Sapphire for X-Ray Beam Project

A PhD in chemistry requested a quote on the following:

I'm looking for a thin window material with a high melting point that is ideally (but is not necessarily) glassy so an X-ray beam can pass through with minimum attenuation. The exact specs are not absolute requirements, but an ideal material would have a thickness of <= 100 microns and a melting point of 1000 – 2000 C. Are there materials or products that you would recommend?

We have 3" 100um DSP Sapphire Wafers as well as Fused Silica!

Reference #253261 for specs and pricing.

Quote 211126 

Requests:               I am looking to buy some sapphire wafers. I would like the c-plane orientation, a circular wafer with diameter 3"" and thickness around 0.5mm (but I can be quite flexible on the thickness). Could you give me quotations for one or both sides polished, and quantities of 10 and 20 for each please? My decision between these options will depend on the prices.

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What Sapphire Substrate Diameters are Available?

We have a large selection of stadard diameters and custom dimension availble. Please send us your specs or click below:




Thin 3" Sapphire Wafers for Electromagnetic Material Characterization

A doctoral candidate requested the following quote:

I am looking for a price for thin sapphire wafers. I saw some on your website down to 0.1 mm thick. Can be random orientation, double side polished. For this application, I just need thin and polished.  Maybe I would buy 10 to start.  We will be cutting them to smaller sizes ourselves.  Do you have something in stock that we could receive quickly?

They will be used to hold a sample in a system for electromagnetic material characterization. 

UniversityWafer, Inc. Quoted:

2" and 3" 100um DSP Sapphire Substrates

Reference # 264183 for specs and pricing.

Nickel (Ni) Coated Sapphire Substrates

A graduate student requested the following:

I am looking for 2" and 3" sapphire (0001) wafers and 4" Si (001) wafer both coated with a Ni thin film of ~25nm (by e-beam evaporation).

Reference #273865 for specs and pricing

What are nickel coated sapphire wafers used for?

Nickel-coated sapphire wafers have several applications in various industries. Here are a few common uses:

  1. Semiconductor industry: Nickel-coated sapphire wafers are used as substrates for the growth of epitaxial layers in the semiconductor industry. The nickel coating provides a suitable surface for the deposition of other materials, such as gallium nitride (GaN) or other semiconductor compounds, enabling the fabrication of high-performance electronic devices like LEDs, power devices, and laser diodes.

  2. Optoelectronics: Sapphire wafers with a nickel coating can be used as substrates for the growth of thin films in optoelectronic devices. The nickel coating helps in bonding the sapphire wafer to other materials, such as indium gallium nitride (InGaN) or indium phosphide (InP), which are commonly used in the production of LEDs, photodetectors, and optical sensors.

  3. Microelectromechanical systems (MEMS): Nickel-coated sapphire wafers are employed in the fabrication of MEMS devices. The nickel layer can act as a sacrificial layer during the manufacturing process, allowing for the creation of intricate microstructures on the sapphire wafer. These microstructures can be used in applications such as pressure sensors, accelerometers, and microfluidic devices.

  4. Substrates for thin film deposition: Nickel-coated sapphire wafers serve as a stable and high-quality substrate for the deposition of various thin films. The nickel layer provides adhesion and compatibility for the subsequent deposition of materials like metals, oxides, or polymers. These coated wafers find applications in thin film technology, including optical coatings, protective layers, and surface engineering.

Overall, nickel-coated sapphire wafers are utilized in the fields of semiconductor manufacturing, optoelectronics, MEMS, and thin film deposition to enable the production of advanced electronic and optical devices.